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Abhishek Gottipati
at Intel Corp
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Author
Publications (5)
Proceedings Article | 10 April 2024 Presentation + Paper
Advanced processing control for wafer-to-wafer hybrid bonding
Nikhil Aditya Kumar Roy, Richard Housley, Dan Engelhard, Hao Wang, Cassie Bayless, Chris Nguyen, Franz Zach, Shubham Badjate, Abhishek Gottipati, Yoav Grauer, Oren Ben-Nun, Roie Volkovich
Proceedings Volume 12955, 129551Q (2024) https://doi.org/10.1117/12.3010036
KEYWORDS: Wafer bonding, Overlay metrology, Semiconducting wafers, Process control, Metrology, 3D metrology, Optical parametric oscillators, Advanced process control, 3D acquisition, Distortion
Proceedings Article | 26 March 2019 Presentation + Paper
Process drift compensation by tunable wavelength homing in scatterometry-based overlay
Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati
Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548
KEYWORDS: Overlay metrology, Scatterometry, Process control
Proceedings Article | 26 March 2019 Paper
Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis
Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati
Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725
KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry
Proceedings Article | 28 March 2017 Paper
Reducing the overlay metrology sensitivity to perturbations of the measurement stack
Yue Zhou, DeNeil Park, Karsten Gutjahr, Abhishek Gottipati, Tam Vuong, Sung Yong Bae, Nicholas Stokes, Aiqin Jiang, Po Ya Hsu, Mark O'Mahony, Andrea Donini, Bart Visser, Chris de Ruiter, Grzegorz Grzela, Hans van der Laan, Martin Jak, Pavel Izikson, Stephen Morgan
Proceedings Volume 10145, 101452G (2017) https://doi.org/10.1117/12.2257913
KEYWORDS: Overlay metrology, Metrology, Scatterometry, Environmental sensing, Image processing, Diffraction gratings, Diffraction, Chemical mechanical planarization, Defense and security, Image analysis
SPIE Journal Paper | 3 August 2015 Open Access
Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology
JM3, Vol. 14, Issue 03, 031208, (August 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031208
KEYWORDS: Line edge roughness, Silicon, Scatterometry, Data modeling, Optical components, Scanning electron microscopy, Picosecond phenomena, Chemical elements, Line width roughness, Optical properties
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