Dr. Christopher L. Soles Profile

Dr. Christopher L. Soles

Group Leader, Electronics Materials Polymers Div at National Institute of Standards and Technology

SPIE Involvement:

Author

Publications (25)

SPIE Journal Paper | 3 April 2023 Open Access

Review of the key milestones in the development of critical dimension small angle x-ray scattering at National Institute of Standards and Technology

Wen-li Wu, R. Joseph Kline, Ronald L. Jones, Hae-Jeong Lee, Eric K. Lin, Daniel F. Sunday, Chengqing Wang, Tengjiao Hu, Christopher L. Soles

JM3, Vol. 22, Issue 03, 031206, (April 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.031206

KEYWORDS: X-rays, Scattering, Metrology, Semiconductors, Critical dimension metrology, Lithography, Industry, Standards development, 3D metrology, Nanostructures

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Proceedings Article | 29 March 2011 Paper

Additive-loaded EUV photoresists: performance enhancement and the underlying physics

Vikram Daga, Ying Lin, James Watkins, Uzodinma Okoroanyanwu, Karen Petrillo, Dominic Ashworth, Hua-Gen Peng, Christopher Soles

Proceedings Volume 7969, 796907 (2011) https://doi.org/10.1117/12.881613

KEYWORDS: Magnesium, Polymers, Photoresist materials, Diffusion, Molecules, Chemical elements, Extreme ultraviolet lithography, Glasses, Extreme ultraviolet, Hydrogen

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Proceedings Article | 24 March 2009 Paper

Nonplanar high-k dielectric thickness measurements using CD-SAXS

Chengqing Wang, Kwang-Woo Choi, Yi-Ching Chen, Jimmy Price, Derek Ho, Ronald Jones, Christopher Soles, Erik Lin, Wen-Li Wu, Benjamin Bunday

Proceedings Volume 7272, 72722M (2009) https://doi.org/10.1117/12.813757

KEYWORDS: Dielectrics, Scanning electron microscopy, Scattering, X-rays, Data modeling, Sensors, Transistors, Critical dimension metrology, Laser scattering, Silicon

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Proceedings Article | 18 March 2009 Paper

In situ measurement of annealing-induced line shape evolution in nanoimprinted polymers using scatterometry

Heather Patrick, Thomas Germer, Yifu Ding, Hyun Wook Ro, Lee Richter, Christopher Soles

Proceedings Volume 7271, 727128 (2009) https://doi.org/10.1117/12.815360

KEYWORDS: Scatterometry, Data modeling, Annealing, Polymers, Ellipsometry, Solids, Atomic force microscopy, Nanoimprint lithography, In situ metrology, Statistical modeling

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Proceedings Article | 28 March 2008 Paper

Porosity characteristics of ultra-low dielectric insulator films directly patterned by nano-imprint lithography

Hyun Wook Ro, Ronald Jones, Huagen Peng, Hae-Jeong Lee, Eric Lin, Alamgir Karim, Do Yoon, David Gidley, Christopher Soles

Proceedings Volume 6921, 69211M (2008) https://doi.org/10.1117/12.773004

KEYWORDS: Dielectrics, Reflectivity, Picosecond phenomena, Nanoimprint lithography, X-rays, Skin, Scattering, Optical lithography, Electron beam lithography, Silicon

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Proceedings Article | 25 March 2008 Paper

Exploring the limitations of x-ray reflectivity as a critical dimension pattern shape metrology

Hae-Jeong Lee, Sangcheol Kim, Christopher Soles, Eric Lin, Wen-Li Wu

Proceedings Volume 6922, 692224 (2008) https://doi.org/10.1117/12.772849

KEYWORDS: X-rays, Polymers, Reflectivity, Metrology, Data modeling, Silicon, Picosecond phenomena, X-ray sources, Thin films, Scattering

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Proceedings Article | 24 March 2008 Paper

CD-SAXS measurements using laboratory-based and synchrotron-based instruments

Chengqing Wang, Kwang-Woo Choi, Wei-En Fu, Derek Ho, Ronald Jones, Christopher Soles, Eric Lin, Wen-Li Wu, James Clarke, Benjamin Bunday

Proceedings Volume 6922, 69222E (2008) https://doi.org/10.1117/12.773774

KEYWORDS: Diffraction, Line width roughness, Line edge roughness, Synchrotrons, X-rays, Satellites, Metrology, X-ray diffraction, Collimation, Scattering

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Proceedings Article | 24 March 2008 Paper

Linewidth roughness and cross-sectional measurements of sub-50 nm structures with CD-SAXS and CD-SEM

Chengqing Wang, Kwang-Woo Choi, Ronald Jones, Christopher Soles, Eric Lin, Wen-li Wu, James Clarke, John Villarrubia, Benjamin Bunday

Proceedings Volume 6922, 69221Z (2008) https://doi.org/10.1117/12.773558

KEYWORDS: Line width roughness, Line edge roughness, Diffraction, X-rays, Critical dimension metrology, Scattering, Sensors, Laser scattering, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 5 April 2007 Paper

Characterizing pattern structures using x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Wook Ro, Shuhui Kang, Eric Lin, Alamgir Karim, Wen-li Wu, D. Hines

Proceedings Volume 6518, 651813 (2007) https://doi.org/10.1117/12.712416

KEYWORDS: X-rays, Reflectivity, Silicon, Data modeling, Metrology, X-ray sources, Scattering, Nanoimprint lithography, Lithography, Laser scattering

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Proceedings Article | 23 March 2006 Paper

The role of stress in nanoimprint lithography

Hyun Ro, Yifu Ding, Hae-Jeong Lee, Daniel Hines, Ronald Jones, Eric Lin, Alamgir Karim, Wen-li Wu, Christopher Soles

Proceedings Volume 6151, 615116 (2006) https://doi.org/10.1117/12.656742

KEYWORDS: Polymers, Polymethylmethacrylate, Nanoimprint lithography, Annealing, Scattering, X-rays, Temperature metrology, Picosecond phenomena, Nanostructures, Reflectivity

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Proceedings Article | 23 March 2006 Paper

Characterizing nanoimprint pattern cross-section and fidelity from x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Ro, D. Hines, Ronald Jones, Eric Lin, Alamgir Karim, Wen-li Wu

Proceedings Volume 6151, 61510N (2006) https://doi.org/10.1117/12.656826

KEYWORDS: Silicon, Reflectivity, X-rays, Data modeling, Nanoimprint lithography, Oxides, Scattering, Semiconducting wafers, Nanostructures, Reactive ion etching

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SPIE Journal Paper | 1 January 2006

Pattern fidelity in nanoimprinted films using critical dimension small angle x-ray scattering

Ronald Jones, Christopher Soles, Eric Lin, Wenchuang Hu, Ronald Reano, Stella Pang, Steven Weigand, Denis Keane, John Quintana

JM3, Vol. 5, Issue 01, 013001, (January 2006) https://doi.org/10.1117/12.10.1117/1.2170550

KEYWORDS: Nanoimprint lithography, Data modeling, Polymers, Polymethylmethacrylate, X-rays, Scattering, Scanning electron microscopy, Diffraction, Picosecond phenomena, Silicon

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Proceedings Article | 6 May 2005 Paper

High-resolution residual layer thickness metrology using x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Ro, Daniel Hines, Ronald Jones, Eric Lin, Wen-li Wu

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600004

KEYWORDS: Reflectivity, Silicon, X-rays, Data modeling, Metrology, Nanoimprint lithography, Scattering, Reactive ion etching, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 6 May 2005 Paper

Pattern fidelity in nanoimprinted films using CD-SAXS

Ronald Jones, Christopher Soles, Eric Lin, Walter Hu, Ronald Reano, Stella Pang, Steven Weigand, Denis Keane, John Quintana

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600267

KEYWORDS: Nanoimprint lithography, Polymers, Polymethylmethacrylate, Data modeling, Scanning electron microscopy, X-rays, Photoresist materials, Diffraction, Silicon, Picosecond phenomena

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Proceedings Article | 4 May 2005 Paper

Water distribution within immersed polymer films

Bryan Vogt, Christopher Soles, Vivek Prabhu, Sushil Satija, Eric Lin, Wen-li Wu

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599746

KEYWORDS: Interfaces, Reflectivity, Silicon, Polymers, Scattering, Water, Head-mounted displays, Polymer thin films, Photoresist materials, Semiconducting wafers

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SPIE Journal Paper | 1 January 2005

Water immersion of model photoresists: interfacial influences on water concentration and surface morphology

Bryan Vogt, Christopher Soles, Chia-Ying Wang, Vivek Prabhu, Patricia McGuiggan, Jack Douglas, Eric Lin, Wen-Li Wu, Sushil Satija, Dario Goldfarb, Marie Angelopoulos

JM3, Vol. 4, Issue 01, 013003, (January 2005) https://doi.org/10.1117/12.10.1117/1.1861852

KEYWORDS: Interfaces, Polymers, Oxides, Head-mounted displays, Photoresist materials, Silicon, Liquids, Absorption, Polymer thin films, Silicon films

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Proceedings Article | 24 May 2004 Paper

Preliminary evaluation of line-edge roughness metrology based on CD-SAXS

Ronald Jones, Tengjiao Hu, Christopher Soles, Eric Lin, Wen-li Wu, Diego Casa, Arpan Mahorowala

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535693

KEYWORDS: Line edge roughness, Scattering, Metrology, Edge roughness, Photoresist materials, Diffraction, X-rays, Diffraction gratings, Fourier transforms, Laser scattering

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Proceedings Article | 14 May 2004 Paper

Measurements of water distribution in thin lithographic films

Bryan Vogt, Christopher Soles, Vivek Prabhu, Ronald Jones, Wen-Li Wu, Eric Lin, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535881

KEYWORDS: Reflectivity, Interfaces, Silicon, Photoresist materials, Polymers, Oxides, Scattering, Thin films, Head-mounted displays, Silicon films

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Proceedings Article | 12 June 2003 Paper

X-ray absorption spectroscopy to probe interfacial issues in photolithography

Joseph Lenhart, Daniel Fischer, Sharadha Sambasivan, Eric Lin, Ronald Jones, Christopher Soles, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485149

KEYWORDS: Carbon, Polymers, Interfaces, Sensors, Luminescence, Line edge roughness, X-rays, Optical lithography, Absorption, Ultraviolet radiation

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Proceedings Article | 12 June 2003 Paper

Deprotection volume characteristics and line-edge morphology in chemically amplified resists

Ronald Jones, Tengjiao Hu, Vivek Prabhu, Christopher Soles, Eric Lin, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos, Brian Trinque, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485146

KEYWORDS: Line edge roughness, Polymers, Scattering, Diffusion, Fractal analysis, Chemically amplified resists, Fuzzy logic, Photoresist materials, Molecules, Motion models

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Proceedings Article | 12 June 2003 Paper

Polymer dynamics and diffusive properties in ultrathin photoresist films

Christopher Soles, Ronald Jones, Joseph Lenhart, Vivek Prabhu, Wen-li Wu, Eric Lin, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485140

KEYWORDS: Diffusion, Polymers, Thin films, Scattering, Crystals, Polymer thin films, Lithography, Absorption, Photoresist materials, Quartz

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Proceedings Article | 12 June 2003 Paper

Polyelectrolyte effects in model photoresist developer solutions: roles of base concentration and added salts

Vivek Prabhu, Ronald Jones, Eric Lin, Christopher Soles, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485147

KEYWORDS: Polymers, Scattering, Photoresist materials, Photoresist developing, Ionization, Interfaces, Ions, Sodium, Standards development, Physics

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Proceedings Article | 24 July 2002 Paper

Chain conformation in ultrathin polymer films

Ronald Jones, Christopher Soles, Francis Starr, Eric Lin, Joseph Lenhart, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474232

KEYWORDS: Polymers, Scattering, Polymer thin films, Thin films, Distortion, Molecules, Silicon, Sensors, Laser scattering, Double positive medium

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Proceedings Article | 24 July 2002 Paper

Measurement of the spatial evolution of the deprotection reaction front with nanometer resolution using neutron reflectometry

Eric Lin, Christopher Soles, Dario Goldfarb, Brian Trinque, Sean Burns, Ronald Jones, Joseph Lenhart, Marie Angelopoulos, C. Grant Willson, Sushil Satija, Wen-li Wu

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474229

KEYWORDS: Polymers, Reflectivity, Interfaces, X-rays, Reflectometry, Photoresist materials, Spatial resolution, Diffusion, Data modeling, Scattering

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