Dr. Eric K. Lin
Group Leader, Electronics Materials at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (46)

SPIE Journal Paper | 3 April 2023 Open Access
JM3, Vol. 22, Issue 03, 031206, (April 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.031206
KEYWORDS: X-rays, Scattering, Metrology, Semiconductors, Critical dimension metrology, Lithography, Industry, Standards development, 3D metrology, Nanostructures

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733U (2009) https://doi.org/10.1117/12.813555
KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

Proceedings Article | 15 April 2008 Paper
Proceedings Volume 6923, 692317 (2008) https://doi.org/10.1117/12.773018
KEYWORDS: Diffusion, Polymers, Photoresist materials, Glasses, FT-IR spectroscopy, Switches, Temperature metrology, Solids, Image resolution, Extreme ultraviolet

Proceedings Article | 28 March 2008 Paper
Proceedings Volume 6921, 69211M (2008) https://doi.org/10.1117/12.773004
KEYWORDS: Dielectrics, Reflectivity, Picosecond phenomena, Nanoimprint lithography, X-rays, Skin, Scattering, Optical lithography, Electron beam lithography, Silicon

Proceedings Article | 25 March 2008 Paper
Proceedings Volume 6922, 692224 (2008) https://doi.org/10.1117/12.772849
KEYWORDS: X-rays, Polymers, Reflectivity, Metrology, Data modeling, Silicon, Picosecond phenomena, X-ray sources, Thin films, Scattering

Proceedings Article | 24 March 2008 Paper
Proceedings Volume 6922, 69222E (2008) https://doi.org/10.1117/12.773774
KEYWORDS: Diffraction, Line width roughness, Line edge roughness, Synchrotrons, X-rays, Satellites, Metrology, X-ray diffraction, Collimation, Scattering

Proceedings Article | 24 March 2008 Paper
Proceedings Volume 6922, 69221Z (2008) https://doi.org/10.1117/12.773558
KEYWORDS: Line width roughness, Line edge roughness, Diffraction, X-rays, Critical dimension metrology, Scattering, Sensors, Laser scattering, Extreme ultraviolet lithography, Extreme ultraviolet

Proceedings Article | 12 April 2007 Paper
Proceedings Volume 6519, 651902 (2007) https://doi.org/10.1117/12.720424
KEYWORDS: Photoresist materials, Line edge roughness, Image quality, Polymers, Diffusion, Photoresist developing, Surface roughness, Image processing, Interfaces, Reflectivity

Proceedings Article | 12 April 2007 Paper
Proceedings Volume 6519, 651943 (2007) https://doi.org/10.1117/12.712407
KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Photoresist developing, Extreme ultraviolet, Optical lithography, Scanning electron microscopy, Standards development, Systems modeling, Performance modeling

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181O (2007) https://doi.org/10.1117/12.725380
KEYWORDS: Line width roughness, Line edge roughness, Diffraction, Critical dimension metrology, Photoresist materials, X-rays, Scattering, Satellites, Extreme ultraviolet lithography, Sensors

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 651813 (2007) https://doi.org/10.1117/12.712416
KEYWORDS: X-rays, Reflectivity, Silicon, Data modeling, Metrology, X-ray sources, Scattering, Nanoimprint lithography, Lithography, Laser scattering

Proceedings Article | 3 April 2007 Paper
Shuhui Kang, Bryan Vogt, Wen-li Wu, Vivek Prabhu, David VanderHart, Ashwin Rao, Eric Lin, Karen Turnquest
Proceedings Volume 6519, 651916 (2007) https://doi.org/10.1117/12.712659
KEYWORDS: Hydrogen, Optical spheres, FT-IR spectroscopy, Polymers, Photoresist materials, Solids, Line edge roughness, Data modeling, Spectroscopy, Polymer thin films

Proceedings Article | 22 March 2007 Paper
Vivek Prabhu, Bryan Vogt, Shuhui Kang, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest
Proceedings Volume 6519, 651910 (2007) https://doi.org/10.1117/12.712311
KEYWORDS: Polymers, Reflectivity, Interfaces, Scattering, Photoresist materials, Photoresist developing, Silicon, X-rays, In situ metrology, Standards development

Proceedings Article | 22 March 2007 Paper
Proceedings Volume 6519, 65193V (2007) https://doi.org/10.1117/12.712682
KEYWORDS: Line edge roughness, Switches, Diffusion, Photoresist materials, Optical spheres, Polymers, 3D modeling, Computer simulations, Photoresist developing, Standards development

Proceedings Article | 15 March 2007 Paper
Proceedings Volume 6517, 651715 (2007) https://doi.org/10.1117/12.712347
KEYWORDS: Nanoimprint lithography, Dielectrics, Reflectivity, Optical lithography, X-rays, Silicon, Semiconductors, Thin films, Electron beam lithography, Lithography

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 615310 (2006) https://doi.org/10.1117/12.656540
KEYWORDS: Polymers, Photoresist materials, Quartz, Crystals, Photoresist developing, Lithography, Chemistry, Molecules, Standards development, Infrared spectroscopy

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 61533N (2006) https://doi.org/10.1117/12.656594
KEYWORDS: Polymers, Photoresist materials, Diffusion, FT-IR spectroscopy, Data modeling, Glasses, Ultraviolet radiation, Spectroscopy, Chemical reactions, Hydrogen

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831
KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

Proceedings Article | 29 March 2006 Paper
Bryan Vogt, Shuhui Kang, Vivek Prabhu, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest, Wen-li Wu
Proceedings Volume 6153, 615316 (2006) https://doi.org/10.1117/12.656464
KEYWORDS: FT-IR spectroscopy, Diffusion, Reflectivity, Line edge roughness, Photoresist materials, Image quality, Image processing, Standards development, Polymers, Scattering

Proceedings Article | 24 March 2006 Paper
Ronald Jones, Wen-li Wu, Cheng-qing Wang, Eric Lin, Kwang-Woo Choi, Bryan Rice, George Thompson, Steven Weigand, Denis Keane
Proceedings Volume 6152, 61520N (2006) https://doi.org/10.1117/12.656829
KEYWORDS: Line edge roughness, Diffraction, Line width roughness, Satellites, Data modeling, X-rays, Scattering, Laser scattering, Scanning electron microscopy, Sensors

Proceedings Article | 23 March 2006 Paper
Proceedings Volume 6151, 61510N (2006) https://doi.org/10.1117/12.656826
KEYWORDS: Silicon, Reflectivity, X-rays, Data modeling, Nanoimprint lithography, Oxides, Scattering, Semiconducting wafers, Nanostructures, Reactive ion etching

Proceedings Article | 23 March 2006 Paper
Proceedings Volume 6151, 615116 (2006) https://doi.org/10.1117/12.656742
KEYWORDS: Polymers, Polymethylmethacrylate, Nanoimprint lithography, Annealing, Scattering, X-rays, Temperature metrology, Picosecond phenomena, Nanostructures, Reflectivity

SPIE Journal Paper | 1 January 2006
Ronald Jones, Christopher Soles, Eric Lin, Wenchuang Hu, Ronald Reano, Stella Pang, Steven Weigand, Denis Keane, John Quintana
JM3, Vol. 5, Issue 01, 013001, (January 2006) https://doi.org/10.1117/12.10.1117/1.2170550
KEYWORDS: Nanoimprint lithography, Data modeling, Polymers, Polymethylmethacrylate, X-rays, Scattering, Scanning electron microscopy, Diffraction, Picosecond phenomena, Silicon

Proceedings Article | 30 August 2005 Paper
Dean DeLongchamp, Eric Lin, Daniel Fischer
Proceedings Volume 5940, 59400A (2005) https://doi.org/10.1117/12.616776
KEYWORDS: Organic semiconductors, X-rays, Absorption, Thin films, Semiconductors, Chemistry, Crystals, Molecules, Carbon, Spectroscopy

Proceedings Article | 10 May 2005 Paper
Ronald Jones, Eric Lin, Wen-li Wu, Steven Weigand, Denis Keane, John Quintana
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600290
KEYWORDS: Data modeling, Scattering, X-rays, Light scattering, Photoresist materials, Diffraction, Statistical modeling, Nondestructive evaluation, Fourier transforms, Metrology

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600004
KEYWORDS: Reflectivity, Silicon, X-rays, Data modeling, Metrology, Nanoimprint lithography, Scattering, Reactive ion etching, Scanning electron microscopy, Semiconducting wafers

Proceedings Article | 6 May 2005 Paper
Ronald Jones, Christopher Soles, Eric Lin, Walter Hu, Ronald Reano, Stella Pang, Steven Weigand, Denis Keane, John Quintana
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600267
KEYWORDS: Nanoimprint lithography, Polymers, Polymethylmethacrylate, Data modeling, Scanning electron microscopy, X-rays, Photoresist materials, Diffraction, Silicon, Picosecond phenomena

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599746
KEYWORDS: Interfaces, Reflectivity, Silicon, Polymers, Scattering, Water, Head-mounted displays, Polymer thin films, Photoresist materials, Semiconducting wafers

Proceedings Article | 4 May 2005 Paper
Vivek Prabhu, Bryan Vogt, Wen-Li Wu, Jack Douglas, Eric Lin, Sushil Satija, Dario Goldfarb, Hiroshi Ito
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598956
KEYWORDS: Polymers, Reflectivity, Interfaces, Ionization, Photoresist materials, Thin films, Photoresist developing, Standards development, Dielectrics, Liquids

SPIE Journal Paper | 1 January 2005
Bryan Vogt, Christopher Soles, Chia-Ying Wang, Vivek Prabhu, Patricia McGuiggan, Jack Douglas, Eric Lin, Wen-Li Wu, Sushil Satija, Dario Goldfarb, Marie Angelopoulos
JM3, Vol. 4, Issue 01, 013003, (January 2005) https://doi.org/10.1117/12.10.1117/1.1861852
KEYWORDS: Interfaces, Polymers, Oxides, Head-mounted displays, Photoresist materials, Silicon, Liquids, Absorption, Polymer thin films, Silicon films

Proceedings Article | 24 May 2004 Paper
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535693
KEYWORDS: Line edge roughness, Scattering, Metrology, Edge roughness, Photoresist materials, Diffraction, X-rays, Diffraction gratings, Fourier transforms, Laser scattering

Proceedings Article | 14 May 2004 Paper
Vivek Prabhu, Michael Wang, Erin Jablonski, Bryan Vogt, Eric Lin, Wen-Li Wu, Dario Goldfarb, Marie Angelopoulos, Hiroshi Ito
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535862
KEYWORDS: Reflectivity, Photoresist developing, Surface roughness, Atomic force microscopy, Polymers, Photoresist materials, Scattering, Critical dimension metrology, Semiconducting wafers, X-rays

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536656
KEYWORDS: Diffusion, Photoresist materials, Polymers, Molecules, Scattering, Interfaces, Lithography, Distance measurement, Manufacturing, Chemically amplified resists

Proceedings Article | 14 May 2004 Paper
Erin Jablonski, Vivek Prabhu, Sharadha Sambasivan, Daniel Fischer, Eric Lin, Dario Goldfarb, Marie Angelopoulos, Hiroshi Ito
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535703
KEYWORDS: Photoresist materials, Ultraviolet radiation, Chemistry, Polymers, Protactinium, Carbon, Thin films, Sensors, Polymer thin films, Semiconducting wafers

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535881
KEYWORDS: Reflectivity, Interfaces, Silicon, Photoresist materials, Polymers, Oxides, Scattering, Thin films, Head-mounted displays, Silicon films

Proceedings Article | 26 June 2003 Paper
Chelladurai Devadoss, Yubao Wang, Rama Puligadda, Joseph Lenhart, Erin Jablonski, Daniel Fischer, Sharadha Sambasivan, Eric Lin, Wen-li Wu
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485347
KEYWORDS: Polymers, Carbon, Chemistry, X-rays, Sensors, Molecules, Chlorine, Thin films, Liquids, Silicon

Proceedings Article | 12 June 2003 Paper
Ronald Jones, Tengjiao Hu, Vivek Prabhu, Christopher Soles, Eric Lin, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos, Brian Trinque, C. Grant Willson
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485146
KEYWORDS: Line edge roughness, Polymers, Scattering, Diffusion, Fractal analysis, Chemically amplified resists, Fuzzy logic, Photoresist materials, Molecules, Motion models

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485147
KEYWORDS: Polymers, Scattering, Photoresist materials, Photoresist developing, Ionization, Interfaces, Ions, Sodium, Standards development, Physics

Proceedings Article | 12 June 2003 Paper
Joseph Lenhart, Daniel Fischer, Sharadha Sambasivan, Eric Lin, Ronald Jones, Christopher Soles, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485149
KEYWORDS: Carbon, Polymers, Interfaces, Sensors, Luminescence, Line edge roughness, X-rays, Optical lithography, Absorption, Ultraviolet radiation

Proceedings Article | 12 June 2003 Paper
Christopher Soles, Ronald Jones, Joseph Lenhart, Vivek Prabhu, Wen-li Wu, Eric Lin, Dario Goldfarb, Marie Angelopoulos
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485140
KEYWORDS: Diffusion, Polymers, Thin films, Scattering, Crystals, Polymer thin films, Lithography, Absorption, Photoresist materials, Quartz

Proceedings Article | 2 June 2003 Paper
Ronald Jones, Tengjiao Hu, Eric Lin, Wen-li Wu, Diego Casa, N. Orji, Theodore Vorburger, Patrick Bolton, George Barclay
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483669
KEYWORDS: Scattering, Metrology, X-rays, Photoresist materials, Diffraction, Scanning electron microscopy, Light scattering, X-ray lithography, Atomic force microscopy, Scatterometry

Proceedings Article | 24 July 2002 Paper
Eric Lin, Christopher Soles, Dario Goldfarb, Brian Trinque, Sean Burns, Ronald Jones, Joseph Lenhart, Marie Angelopoulos, C. Grant Willson, Sushil Satija, Wen-li Wu
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474229
KEYWORDS: Polymers, Reflectivity, Interfaces, X-rays, Reflectometry, Photoresist materials, Spatial resolution, Diffusion, Data modeling, Scattering

Proceedings Article | 24 July 2002 Paper
Ronald Jones, Christopher Soles, Francis Starr, Eric Lin, Joseph Lenhart, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474232
KEYWORDS: Polymers, Scattering, Polymer thin films, Thin films, Distortion, Molecules, Silicon, Sensors, Laser scattering, Double positive medium

Proceedings Article | 16 July 2002 Paper
Eric Lin, Ronald Jones, Wen-li Wu, John Barker, Patrick Bolton, George Barclay
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473493
KEYWORDS: Diffraction, Scattering, Laser scattering, Diffraction gratings, Sensors, Standards development, Scanning electron microscopy, Photoresist materials, Crystals, Silicon

Proceedings Article | 24 August 2001 Paper
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436863
KEYWORDS: Reflectivity, X-rays, Polymers, Polymer thin films, Interfaces, Absorption, Thin films, Silicon, Lithography, Head-mounted displays

Proceedings Article | 22 August 2001 Paper
Eric Lin, Wen-li Wu, Qinghuang Lin, Marie Angelopoulos
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436767
KEYWORDS: Scattering, Diffraction, Laser scattering, Sensors, Scanning electron microscopy, Photoresist materials, Lithography, Silicon, Diffraction gratings, Semiconducting wafers

Showing 5 of 46 publications
Conference Committee Involvement (2)
Organic Field-Effect Transistors V
13 August 2006 | San Diego, California, United States
Organic Field-Effect Transistors IV
31 July 2005 | San Diego, California, United States
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