Dr. Minoru Toriumi Profile

Dr. Minoru Toriumi

at Tokyo Univ. of Science

SPIE Involvement:

Author

Profile Summary

Minoru Toriumi received his ph. D. in Chemistry from Tokyo Institute of Technology in 1984. He has studied the photoresists materials at Hitachi Central Research Laboratory, Daikin Industries, Ltd. and Osaka University. He presides over Laboratory for Interdisciplinary Science and Technology to study resist materials and applications of the free electron laser at Tokyo University of Science.

Publications (28)

Proceedings Article | 13 March 2018 Presentation + Paper

Presentation + Paper

Resist-polymer ablation by mid-infrared-free-electron laser

Minoru Toriumi, Takayasu Kawasaki, Mitsunori Araki, Takayuki Imai, Koichi Tsukiyama

Proceedings Volume 10586, 1058613 (2018) https://doi.org/10.1117/12.2297163

KEYWORDS: Free electron lasers, Laser ablation, Silicon, Mid-IR, Polymers, Absorption, Chemical analysis, Chemistry

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Proceedings Article | 13 March 2018 Paper

Paper

Characterization of metal resist for EUV lithography using Infrared free electron laser

Minoru Toriumi, Takayasu Kawasaki, Takayuki Imai, Koichi Tsukiyama, Julius Joseph Santillan, Toshiro Itani

Proceedings Volume 10586, 105860E (2018) https://doi.org/10.1117/12.2297156

KEYWORDS: Metals, Extreme ultraviolet lithography, Infrared radiation, Infrared lasers, Extreme ultraviolet, Photoresist developing, Lithography, Free electron lasers, Scientific research, Photoresist processing

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Proceedings Article | 25 March 2016 Paper

Paper

Characterization of 'metal resist' for EUV lithography

Minoru Toriumi, Yuta Sato, Reiji Kumai, Yoshiyuki Yamashita, Koichi Tsukiyama, Toshiro Itani

Proceedings Volume 9779, 97790G (2016) https://doi.org/10.1117/12.2219030

KEYWORDS: Metals, Extreme ultraviolet lithography, Extreme ultraviolet, FT-IR spectroscopy, Light sources, X-ray diffraction, Photoemission spectroscopy, Scanning transmission electron microscopy, Free electron lasers, Lithography, Molecules, Zirconium, Oxides, X-rays, Chemical species

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Proceedings Article | 20 March 2015 Paper

Paper

Inhomogeneity of PAGs in a hybrid-type EUV resist system studied by molecular-dynamics simulations for EUV lithography

Minoru Toriumi, Toshiro Itani

Proceedings Volume 9425, 942508 (2015) https://doi.org/10.1117/12.2085691

KEYWORDS: Extreme ultraviolet, Diffusion, Polymers, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Computer simulations, Solids, Ions, 3D modeling

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Proceedings Article | 27 March 2014 Paper

Paper

Inhomogeneity of PAGs in resist film studied by molecular-dynamics simulations for EUV lithography

Minoru Toriumi, Toshiro Itani

Proceedings Volume 9051, 90511C (2014) https://doi.org/10.1117/12.2045872

KEYWORDS: Chemical species, Polymers, Line edge roughness, Extreme ultraviolet lithography, Sulfur, Molecular interactions, Extreme ultraviolet, Fluorine, Molecules, Oxygen

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Proceedings Article | 31 March 2010 Paper

Paper

Theoretical analysis of energy dissipation of electron in the resists II

Minoru Toriumi

Proceedings Volume 7639, 76392N (2010) https://doi.org/10.1117/12.846503

KEYWORDS: Scattering, Ions, Ionization, Molecules, Monte Carlo methods, Lithography, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Product distribution

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Proceedings Article | 1 April 2009 Paper

Paper

Theoretical analysis of energy degradation of electrons in the resists

Minoru Toriumi

Proceedings Volume 7273, 72732X (2009) https://doi.org/10.1117/12.813940

KEYWORDS: Ionization, Molecules, Lithography, Extreme ultraviolet lithography, Ions, Extreme ultraviolet, Absorption, Solids, Polymers, Electronic components

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Proceedings Article | 1 April 2009 Paper

Paper

Theoretical analysis of development behavior of resist measured by QCM

Minoru Toriumi

Proceedings Volume 7273, 72732Y (2009) https://doi.org/10.1117/12.813939

KEYWORDS: Data modeling, Diffusion, Protactinium, Crystals, Quartz, Visualization, Quantitative analysis, Polymers, Visual analytics, Polymer thin films

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Proceedings Article | 26 March 2008 Paper

Paper

Surface roughness of molecular resist for EUV lithography

Minoru Toriumi, Koji Kaneyama, Shinji Kobayashi, Toshiro Itani

Proceedings Volume 6923, 69230L (2008) https://doi.org/10.1117/12.772349

KEYWORDS: Polymers, Surface roughness, Line edge roughness, Spatial frequencies, Extreme ultraviolet lithography, Atomic force microscopy, Polymer thin films, Extreme ultraviolet, Photoresist processing, Image processing

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Proceedings Article | 6 April 2007 Paper

Paper

Dissolution behavior of resist polymers studied by Quartz-Crystal-Microbalance method II

Minoru Toriumi, Fumihiko Okabe, Masahiko Kitayama

Proceedings Volume 6519, 651913 (2007) https://doi.org/10.1117/12.711926

KEYWORDS: Polymers, Protactinium, Data modeling, Statistical analysis, Solids, Interfaces, Quartz, Crystals, Liquids, Modulation

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Proceedings Article | 29 March 2006 Paper

Paper

Diffusion mechanism of water for immersion lithography

Minoru Toriumi, Chie Matsubara, Akihiko Otoguro, Toshiro Itani

Proceedings Volume 6153, 615311 (2006) https://doi.org/10.1117/12.656208

KEYWORDS: Diffusion, Polymers, Immersion lithography, Polymer thin films, Water, Solids, Liquids, Molecules, Lithography, Crystals

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Proceedings Article | 29 March 2006 Paper

Paper

Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography

Masahiko Kitayama, Ichihiro Aratani, Minoru Toriumi

Proceedings Volume 6153, 61532A (2006) https://doi.org/10.1117/12.656159

KEYWORDS: Polymers, Polymer thin films, Lithography, Quartz, Crystals, Oscillators, Line edge roughness, Absorption, Thin films, Photoresist processing

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Proceedings Article | 29 March 2006 Paper

Paper

Development of fluoropolymer for 193nm immersion lithography

Naoko Shirota, Yoko Takebe, Takashi Sasaki, Osamu Yokokoji, Minoru Toriumi, Hiroshi Masuhara

Proceedings Volume 6153, 615324 (2006) https://doi.org/10.1117/12.656234

KEYWORDS: Polymers, Diffusion, Fluorine, Immersion lithography, Crystals, Quartz, Silicon, Water, Data analysis, Oscillators

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Proceedings Article | 4 May 2005 Paper

Paper

Dissolution behavior of resist polymers studied using quartz crystal microbalance method

Minoru Toriumi

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599279

KEYWORDS: Polymers, Quartz, Crystals, Protactinium, Solids, Data modeling, Oscillators, Crystallography, Liquids, Diffusion

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Proceedings Article | 14 May 2004 Paper

Paper

The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

Takuji Ishikawa, Tetsuhiro Kodani, Meiten Koh, Tsukasa Moriya, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Minoru Toriumi, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533901

KEYWORDS: Polymers, Transparency, Lithography, Fluorine, Absorbance, Photomasks, Standards development, Phase shifts, Polymer thin films, Absorption

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Proceedings Article | 14 May 2004 Paper

Paper

Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography

Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii, Takuji Ishikawa, Meiten Koh, Tetsuhiro Kodani, Tsukasa Moriya, Tsuneo Yamashita, Takayuki Araki, Minoru Toriumi, Hirokazu Aoyama

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535098

KEYWORDS: Polymers, Absorption, Lithography, Resistance, Absorbance, Line edge roughness, Fluorine, Industrial chemicals, Transparency, Chlorine

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Proceedings Article | 12 June 2003 Paper

Paper

Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers

Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani, Takuji Ishikawa, Meiten Koh, Takayuki Araki, Minoru Toriumi, T. Kodani, Hirokazu Aoyama, Tsuneo Yamashita

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485046

KEYWORDS: Polymers, Fluorine, Lithography, Transparency, Absorption, Polymerization, Standards development, Chemical species, Photoresist developing, Vacuum ultraviolet

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Proceedings Article | 12 June 2003 Paper

Paper

Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Meiten Koh, Takuji Ishikawa, Minoru Toriumi, Takayuki Araki, Tsuneo Yamashita, Hirokazu Aoyama, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485077

KEYWORDS: Polymers, Fluorine, Transparency, Absorbance, Absorption, Chemical species, Standards development, Photoresist materials, Spectroscopy, Vacuum ultraviolet

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Proceedings Article | 12 June 2003 Paper

Paper

Novel main-chain-fluorinated polymers for 157-nm photoresists

Minoru Toriumi, Meiten Koh, Takuji Ishikawa, T. Kodani, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485085

KEYWORDS: Polymers, Transparency, Absorption, Polymerization, Resistance, Etching, Lithography, Fluorine, Standards development, Absorbance

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Proceedings Article | 24 July 2002 Paper

Paper

Fluoropolymer resists for 157-nm lithography

Minoru Toriumi, Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474218

KEYWORDS: Polymers, Absorption, Lithography, Fluorine, Etching, Resistance, Transparency, Chemical species, Transmittance, Photomasks

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Proceedings Article | 24 July 2002 Paper

Paper

Dry-etch resistance of fluorine functionalized polymers

Meiten Koh, Takuji Ishikawa, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Tamio Yamazaki, Hiroyuki Watanabe, Minoru Toriumi, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474246

KEYWORDS: Fluorine, Polymers, Etching, Dry etching, Chemical species, Resistance, Lithography, Carbon, Reactive ion etching, Data modeling

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Proceedings Article | 24 July 2002 Paper

Paper

Dissolution characteristics of resist polymers studied by quartz crystal microbalance transmission-line analysis and pKa acidity analysis

Minoru Toriumi, Toshiro Itani, Jun Yamashita, Tomomi Sekine, Kiyoharu Nakatani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474163

KEYWORDS: Polymers, Crystals, Standards development, Quartz, Fluorine, Lithography, Photoresist processing, Liquids, Solids, Optical lithography

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Proceedings Article | 24 July 2002 Paper

Paper

157-nm single-layer resists based on advanced fluorinated polymers

Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474247

KEYWORDS: Polymers, Transparency, Standards development, Lithography, Etching, Fluorine, Vacuum ultraviolet, Dry etching, Reactive ion etching, Absorbance

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Proceedings Article | 24 July 2002 Paper

Paper

Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization

Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji Okada, Yasuhide Kawaguchi, Naomi Shida, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474160

KEYWORDS: Polymers, Polymerization, Glasses, Transparency, Photoresist materials, Lithography, Phase shifts, Photomasks, Manganese, Fluorine

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Proceedings Article | 24 August 2001 Paper

Paper

Resist materials for 157-nm lithography

Minoru Toriumi, Seiichi Ishikawa, Seiro Miyoshi, Takuya Naito, Tamio Yamazaki, Manabu Watanabe, Toshiro Itani

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436868

KEYWORDS: Polymers, Absorption, Lithography, Etching, Standards development, Resistance, Photoresist materials, Transparency, Fluorine, Transmittance

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Proceedings Article | 23 June 2000 Paper

Paper

Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics

Minoru Toriumi, Ichiro Okabe, Takeshi Ohfuji, Masayuki Endo, Hiroaki Morimoto

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388269

KEYWORDS: Diffusion, Polymers, Polymethylmethacrylate, Molecules, Polymer thin films, Chemically amplified resists, Molecular interactions, Chemical species, Matrices, Chemical analysis

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Proceedings Article | 11 June 1999 Paper

Paper

Analysis of molecular diffusion in resist polymer films simulated by molecular dynamics

Minoru Toriumi, Takeshi Ohfuji, Masayuki Endo, Hiroaki Morimoto

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350220

KEYWORDS: Diffusion, Polymers, Chemical species, Molecules, Oxygen, Molecular interactions, Hydrogen, Polymer thin films, Polymethylmethacrylate, Chemically amplified resists

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Proceedings Article | 1 June 1991 Paper

Paper

Structure of poly(p-hydroxystyrene) film

Minoru Toriumi, Masatoshi Yanagimachi, Hiroshi Masuhara

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46394

KEYWORDS: Luminescence, Excimers, Interfaces, Thin films, Polymers, Nitrogen, Molecules, Polymer thin films, Solids, Fluorescence spectroscopy

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Showing 5 of 28 publications

Conference Committee Involvement (2)

Advances in Resist Materials and Processing Technology XXIII

20 February 2006 | San Jose, California, United States

Advances in Resist Technology and Processing XXI

23 February 2004 | Santa Clara, California, United States

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