Dr. Insung Kim
Master (VP of Technology) at SAMSUNG Electronics Co Ltd
Publications (45)

Proceedings Article | 17 December 2024 Presentation + Paper
Proceedings Volume PC12953, PC129530N (2024) https://doi.org/10.1117/12.3010035
KEYWORDS: Semiconducting wafers, Overlay metrology, Surface roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Process control, Lithography, Deformation, Optical alignment, Chemical vapor deposition

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295306 (2024) https://doi.org/10.1117/12.3009878
KEYWORDS: Wavefronts, Extreme ultraviolet, Extreme ultraviolet lithography, Light sources and illumination, Stochastic processes, Diffraction, Optical lithography, Source mask optimization, Projection systems

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129550N (2024) https://doi.org/10.1117/12.3010831
KEYWORDS: Metrology, Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Metals, High volume manufacturing, Contour extraction, Computer aided design, Design

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 129553E (2024) https://doi.org/10.1117/12.3010991
KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Diffraction, Scanners, Dose control, Design, Wafer level optics, Optical sensing, Diffraction gratings

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 127500B (2023) https://doi.org/10.1117/12.2687461
KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes, Optical lithography, Bridges, Scanning electron microscopy, Resistance, Photoresist materials, Extreme ultraviolet, Metals

Proceedings Article | 26 February 2021 Presentation + Paper
D. De Simone, L. Kljucar, P. Das, R. Blanc, C. Beral, J. Severi, N. Vandenbroeck, P. Foubert, A. Charley, A. Oak, D. Xu, W. Gillijns, J. Mitard, Z. Tokei, M. van der Veen, N. Heylen, L. Teugels, Q. T. Le, F. Schleicher, P. Leray, K. Ronse, Il Hwan Kim, Insung Kim, Changmin Park, Jisun Lee, Koungmin Ryu, P. De Schepper, J. Doise, M. Kocsis
Proceedings Volume 11609, 116090Q (2021) https://doi.org/10.1117/12.2584713
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Oxides, Metals, Extreme ultraviolet, Scanners, Scanning electron microscopy, Photoresist processing, Lithography, Line edge roughness

Proceedings Article | 22 February 2021 Presentation
Yaniv Abramovitz, Boo-Hyun Ham, Sangho Jo, Byoung-Hoon Kim, Jongsu Kim, Insung Kim, Kevin Houchens, Noam Shaham, Jeong Ho_Yeo, PavanKumar Mannava
Proceedings Volume 11611, 116111Z (2021) https://doi.org/10.1117/12.2585369
KEYWORDS: Image enhancement, Overlay metrology, Metrology, Hassium, Scanning electron microscopy, Process control, Optical lithography, Measurement devices, Inspection, Electron beam lithography

Proceedings Article | 24 March 2017 Open Access Presentation + Paper
Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam
Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Proceedings Article | 17 April 2014 Paper
Chang-Min Park, Insung Kim, Sang-Hyun Kim, Dong-Wan Kim, Myung-Soo Hwang, Soon-Nam Kang, Cheolhong Park, Hyun-Woo Kim, Jeong-Ho Yeo, Seong-Sue Kim
Proceedings Volume 9048, 90480S (2014) https://doi.org/10.1117/12.2046132
KEYWORDS: Deep ultraviolet, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Scanners, Pellicles, Reflectivity, Semiconducting wafers, Particles, Etching

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 86812K (2013) https://doi.org/10.1117/12.2011677
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Line edge roughness, Extreme ultraviolet, Scanning electron microscopy, Atomic force microscopy, Spectroscopic ellipsometry, Photoresist processing, Calibration, Critical dimension metrology

SPIE Journal Paper | 18 March 2013
JM3, Vol. 12, Issue 02, 021006, (March 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.021006
KEYWORDS: Photomasks, Reticles, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Cadmium, Reflectivity, Scanners, Semiconductors

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85220P (2012) https://doi.org/10.1117/12.970395
KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Scanners, Reflectivity, Cadmium, Semiconductors

Proceedings Article | 14 October 2011 Paper
Frank A. J. M. Driessen, Natalia Davydova, J. Jiang, H. Kang, V. Vaenkatesan, D. Oorschot, I. Kim, S. Kang, Y. Lee, J. Yeo, K. Gronlund, H. Liu, K. van Ingen-Schenau, R. Peeters, C. Wagner, J. Zimmermann, O. Schumann
Proceedings Volume 8166, 81660Z (2011) https://doi.org/10.1117/12.898955
KEYWORDS: Semiconducting wafers, Scanners, Photomasks, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Deep ultraviolet, Metrology, Critical dimension metrology

Proceedings Article | 7 April 2011 Paper
Hyun-Woo Kim, Hai-Sub Na, Chang-Min Park, Cheolhong Park, Sumin Kim, Chawon Koh, In-Sung Kim, Han-Ku Cho
Proceedings Volume 7969, 796916 (2011) https://doi.org/10.1117/12.879791
KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Deep ultraviolet, Reflectivity, Extreme ultraviolet lithography, Line width roughness, Photoresist processing, Resolution enhancement technologies, Photomasks, Plasma

Proceedings Article | 5 April 2011 Paper
Proceedings Volume 7969, 79690S (2011) https://doi.org/10.1117/12.880230
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Photomasks, Reticles, Extreme ultraviolet lithography, 193nm lithography, Lithography, Manufacturing, Optical lithography, Model-based design

Proceedings Article | 3 April 2010 Paper
C. Park, K. Kim, Y. Lee, K. Cho, J. Park, In Kim, J. Yeo, S. Choi, D. Lee, B. Lee, S. Hwang
Proceedings Volume 7637, 76371R (2010) https://doi.org/10.1117/12.846481
KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Electron beam lithography, Lithography, Line width roughness, Etching, Photomasks, Silicon, Optical lithography, Quartz

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727142 (2009) https://doi.org/10.1117/12.813996
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, Reflectivity, Scanners, Critical dimension metrology, EUV optics, Optical calibration, Cadmium

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727114 (2009) https://doi.org/10.1117/12.814001
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Etching, Photomasks, Semiconducting wafers, Scanners, Optical proximity correction, Light sources, Resistance

Proceedings Article | 4 December 2008 Paper
Nakgeuon Seong, Insung Kim, Dongwoo Kang, Sang-Ho Lee, Jinphil Choi
Proceedings Volume 7140, 714042 (2008) https://doi.org/10.1117/12.804557
KEYWORDS: Diffusion, Critical dimension metrology, SRAF, Optical simulations, Cadmium, Control systems, Fiber optic illuminators, Tolerancing, Lithographic illumination, Semiconductors

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714009 (2008) https://doi.org/10.1117/12.804673
KEYWORDS: Point spread functions, Fractal analysis, Extreme ultraviolet, Lithography, Optical proximity correction, Photomasks, Critical dimension metrology, Modulation transfer functions, Convolution, Cadmium

Proceedings Article | 20 March 2008 Paper
T. Schmoeller, T. Klimpel, I. Kim, G. Lorusso, A. Myers, R. Jonckheere, A. Goethals, K. Ronse
Proceedings Volume 6921, 69211B (2008) https://doi.org/10.1117/12.772640
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Projection systems, Imaging systems, Near field, Extreme ultraviolet lithography, Lithography, Reflectivity, Lithographic illumination

Proceedings Article | 20 March 2008 Paper
G. Lorusso, J. Hermans, A. M. Goethals, B. Baudemprez, F. Van Roey, A. Myers, I. Kim, B. S. Kim, R. Jonckheere, A. Niroomand, S. Lok, A. Van Dijk, J.-F. de Marneffe, S. Demuynck, D. Goossens, K. Ronse
Proceedings Volume 6921, 69210O (2008) https://doi.org/10.1117/12.771983
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Etching, Photomasks, Manufacturing, Overlay metrology, Printing, Photoresist processing, Scanners

Proceedings Article | 29 May 2007 Paper
Young-Chang Kim, Donghyun Kim, Insung Kim, Sangwook Kim, Sungsoo Suh, Yong-Jin Chun, Sukjoo Lee, Junghyeon Lee, Chang-Jin Kang, Jootae Moon, Kunal Taravade, Sooryong Lee
Proceedings Volume 6607, 66071M (2007) https://doi.org/10.1117/12.728969
KEYWORDS: Optical proximity correction, Stereolithography, Stray light, Convolution, Photomasks, Modulation transfer functions, Spatial light modulators, Semiconducting wafers, Image quality, Critical dimension metrology

Proceedings Article | 11 May 2007 Paper
Rik Jonckheere, Gian Francesco Lorusso, Anne Marie Goethals, Jan Hermans, Bart Baudemprez, Alan Myers, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nickolay Stepanenko, Kurt Ronse
Proceedings Volume 6607, 66070H (2007) https://doi.org/10.1117/12.729259
KEYWORDS: Reticles, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Silicon, Multilayers, Carbon, Contamination, Point spread functions

Proceedings Article | 26 March 2007 Paper
Young-Chang Kim, Insung Kim, JeongGeun Park, Sangwook Kim, Sungsoo Suh, Yongjin Cheon, Sukjoo Lee, Junghyeon Lee, Chang-Jin Kang, Jootae Moon, Jonathan Cobb, Sooryong Lee
Proceedings Volume 6520, 65200T (2007) https://doi.org/10.1117/12.711832
KEYWORDS: Optical proximity correction, 3D modeling, Photomasks, Near field, Polarization, Chromium, 3D image processing, Transmittance, Binary data, Optical lithography

Proceedings Article | 13 March 2007 Paper
Anne Marie Goethals, Rik Jonckheere, Gian Francesco Lorusso, Jan Hermans, Frieda Van Roey, Alan Myers, Manish Chandhok, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nikolay Stepanenko, Roel Gronheid, Bart Baudemprez, Kurt Ronse
Proceedings Volume 6517, 651709 (2007) https://doi.org/10.1117/12.710798
KEYWORDS: Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Photomasks, Line edge roughness, Point spread functions, Scanners, Lithography, Printing, Critical dimension metrology

Proceedings Article | 24 March 2006 Paper
Sunggon Jung, In-Sung Kim, Young-Seog Kang, Gi-Sung Yeo, Sang-Gyun Woo, HanKu Cho, Joo-Tae Moon
Proceedings Volume 6156, 61561H (2006) https://doi.org/10.1117/12.655954
KEYWORDS: Optical proximity correction, Data modeling, Performance modeling, Model-based design, Instrument modeling, Scanners, Optical lithography, Image filtering, Error analysis, Calibration

Proceedings Article | 15 March 2006 Paper
Sook Lee, In-Sung Kim, Yong-Jin Chun, Sang-Wook Kim, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume 6154, 61541R (2006) https://doi.org/10.1117/12.655998
KEYWORDS: Optical proximity correction, Photomasks, 3D modeling, Binary data, 3D acquisition, Lithography, Data modeling, Diffusion, 3D image processing, Optimization (mathematics)

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61542E (2006) https://doi.org/10.1117/12.655026
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Electroluminescence, Logic devices, Tolerancing, Resolution enhancement technologies, Instrument modeling, Model-based design, Semiconductor manufacturing

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560L (2006) https://doi.org/10.1117/12.655482
KEYWORDS: Optical proximity correction, Design for manufacturing, Photomasks, Semiconducting wafers, Visualization, Image quality, Lithography, Manufacturing, Image processing, Critical dimension metrology

Proceedings Article | 5 November 2005 Paper
Sungsoo Suh, Young-seog Kang, In-sung Kim, Sang-gyun Woo, Hanku Cho, Joo-tae Moon
Proceedings Volume 5992, 599220 (2005) https://doi.org/10.1117/12.632376
KEYWORDS: Optical proximity correction, Data modeling, Calibration, Semiconducting wafers, Reticles, Image processing, Process modeling, Photomasks, Signal processing, Model-based design

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599013
KEYWORDS: Optical proximity correction, Model-based design, Resolution enhancement technologies, Lithography, Scanning electron microscopy, Photography, Process modeling, Photomasks, Scanners, Semiconducting wafers

Proceedings Article | 10 May 2005 Paper
S. Suh, I. Kim, E. Lee, Y. Kang, S. Lee, S. Woo, H. Cho
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598698
KEYWORDS: Optical proximity correction, Scatterometry, Metrology, Data modeling, Semiconducting wafers, Critical dimension metrology, Model-based design, Optical testing, Inspection, Calibration

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536356
KEYWORDS: Lithographic illumination, Lithography, Monochromatic aberrations, Critical dimension metrology, Optical proximity correction, Optical components, Optical lithography, Computing systems, Mathematical modeling, Holographic optical elements

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536280
KEYWORDS: Calibration, Lithography, Scanning electron microscopy, Data conversion, Refractive index, Device simulation, Diffusion, Scanners, Instrument modeling, Nanoimprint lithography

Proceedings Article | 20 May 2004 Paper
In-Sung Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536253
KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Optical lithography, Semiconducting wafers, Overlay metrology, Silicon carbide, Silicon, Spectral resolution, Electron beam direct write lithography

Proceedings Article | 29 April 2004 Paper
Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.536345
KEYWORDS: Photomasks, Diffusion, Convolution, Lithography, Lithographic illumination, Semiconductors, Image sensors, Semiconducting wafers, Scanners, Electron beams

Proceedings Article | 26 June 2003 Paper
Soo-Han Choi, Ji-Soong Park, Chul-Hong Park, Won-Young Chung, In-sung Kim, Dong-Hyun Kim, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485397
KEYWORDS: SRAF, Etching, Critical dimension metrology, Logic devices, Process control, Process modeling, Semiconductors, Control systems, Plasma, Instrument modeling

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467479
KEYWORDS: Tolerancing, Critical dimension metrology, Photomasks, Electroluminescence, Cadmium, Diffusion, Convolution, Optical lithography, Semiconducting wafers, Scanners

Proceedings Article | 30 July 2002 Paper
Insung Kim, Sung-gon Jung, Hyung-Do Kim, Gisung Yeo, In-Gyun Shin, Junghyun Lee, Hanku Cho, Joo-Tae Moon
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474595
KEYWORDS: Transmittance, Lithography, Photomasks, Nanoimprint lithography, Electroluminescence, Scanners, Image transmission, Optical lithography, Image quality, Roads

Proceedings Article | 11 March 2002 Paper
Hyunjae Kang, Byeongsoo Kim, Joonsoo Park, Insung Kim, Gisung Yeo, Junghyun Lee, Hanku Cho, Joo-Tae Moon
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458274
KEYWORDS: Atrial fibrillation, Optical proximity correction, Optical lithography, Lithography, Photomask technology, Resolution enhancement technologies, Lithographic illumination, Photomasks

Proceedings Article | 14 September 2001 Paper
Joonsoo Park, Gisung Yeo, Insung Kim, Byeongsoo Kim, Junghyun Lee, Hanku Cho, Joo-Tae Moon
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435720
KEYWORDS: Optical proximity correction, Photomasks, Atrial fibrillation, Lithography, Critical dimension metrology, Resolution enhancement technologies, Scanners, Lithium, Nanoimprint lithography, Lithographic illumination

Proceedings Article | 22 January 2001 Paper
Byeongsoo Kim, Insung Kim, Gisung Yeo, Junghyun Lee, Ji-Hyeon Choi, Hanku Cho, Joo-Tae Moon
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410722
KEYWORDS: Atrial fibrillation, Optical proximity correction, Photomasks, Optical lithography, Semiconducting wafers, Defect inspection, Lithography, Critical dimension metrology, Mask making, Resolution enhancement technologies

Proceedings Article | 18 August 2000 Paper
Insung Kim, Byeongsoo Kim, Junghyun Lee, Hanku Cho, Joo-Tae Moon
Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395744
KEYWORDS: Lithography, Scanners, Resolution enhancement technologies, Lithographic illumination, Phase shifting, Photomasks, Image contrast enhancement, Image enhancement, Optical lithography, Optical proximity correction

Proceedings Article | 26 July 1999 Paper
Insung Kim, Junghyun Lee, DongHo Cha, Joonsoo Park, Hanku Cho, Joo-Tae Moon
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354405
KEYWORDS: Lithography, Optical lithography, Resolution enhancement technologies, Diffraction, Scanners, Photomasks, Transmittance, Image quality, Semiconducting wafers, Electronics

Showing 5 of 45 publications
Conference Committee Involvement (11)
Optical and EUV Nanolithography XXXVIII
24 February 2025 | San Jose, California, United States
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Showing 5 of 11 Conference Committees
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