Dr. Kurt G. Ronse
Director Lithography at imec
Publications (97)

SPIE Journal Paper | 18 November 2024
JM3, Vol. 24, Issue 01, 011007, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011007

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13216, 1321604 (2024) https://doi.org/10.1117/12.3047176
KEYWORDS: Metals, Optical lithography, Logic, Semiconducting wafers, Extreme ultraviolet lithography, Etching, Scanning electron microscopy, Lithography, Tin

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 132150N (2024) https://doi.org/10.1117/12.3034701
KEYWORDS: Optical lithography, Extreme ultraviolet, Directed self assembly, Sustainability, Stochastic processes, Phase shifts, Materials processing, Lithography, Extreme ultraviolet lithography, Design

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 1321505 (2024) https://doi.org/10.1117/12.3033432
KEYWORDS: Photomasks, Wavefronts, Logic, Source mask optimization, Extreme ultraviolet, Optical lithography, Light sources and illumination, Diffraction, Scanners

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 132150K (2024) https://doi.org/10.1117/12.3034646
KEYWORDS: Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Directed self assembly, Photoresist developing, Reticles, Photoresist materials, Line width roughness, Semiconducting wafers, Line edge roughness

Proceedings Article | 18 September 2024 Paper
Proceedings Volume 13273, 1327304 (2024) https://doi.org/10.1117/12.3030694
KEYWORDS: Extreme ultraviolet, Scanners, Logic, High volume manufacturing, Extreme ultraviolet lithography, Optical lithography, Line edge roughness, Ecosystems, Double patterning technology, Reflectivity

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530O (2024) https://doi.org/10.1117/12.3010846
KEYWORDS: 3D mask effects, Light sources and illumination, SRAF, Diffraction, Semiconducting wafers, Printing, Extreme ultraviolet lithography, Critical dimension metrology, 3D modeling

SPIE Journal Paper | 14 November 2023
JM3, Vol. 22, Issue 04, 043202, (November 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.043202
KEYWORDS: Nanoimprint lithography, Extreme ultraviolet, Polarization, Polarizers, Extreme ultraviolet lithography, Light sources and illumination, 3D mask effects, Diffraction, 3D modeling, Polarized light

Proceedings Article | 27 September 2023 Presentation
Proceedings Volume PC12915, PC1291501 (2023) https://doi.org/10.1117/12.3012427

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12495, 124951U (2023) https://doi.org/10.1117/12.2658866
KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Photomasks, Fin field effect transistors, Optical lithography, Front end of line, Manufacturing, Back end of line, Yield improvement, Extreme ultraviolet lithography

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 1249405 (2023) https://doi.org/10.1117/12.2659153
KEYWORDS: Extreme ultraviolet, Polarization, Light sources and illumination, Polarizers, 3D mask effects, 3D modeling, Diffraction, Polarized light, Refractive index, EUV optics

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12052, 1205203 (2022) https://doi.org/10.1117/12.2617415
KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Photomasks, Manufacturing, Optical lithography, Yield improvement, Front end of line, Semiconductor manufacturing, Performance modeling, Back end of line

Proceedings Article | 12 October 2021 Presentation + Paper
Gioele Mirabelli, Jane Wang, Darko Trivkovic, Pieter Weckx, Alessio Spessot, Kurt Ronse, Ryoung Han Kim, Geert Hellings, Julien Ryckaert
Proceedings Volume 11854, 118540D (2021) https://doi.org/10.1117/12.2600804
KEYWORDS: Extreme ultraviolet, Optical lithography, Metals, Lithography, Extreme ultraviolet lithography, Back end of line, Semiconducting wafers, Standards development, Front end of line, Very large scale integration

Proceedings Article | 26 February 2021 Presentation + Paper
D. De Simone, L. Kljucar, P. Das, R. Blanc, C. Beral, J. Severi, N. Vandenbroeck, P. Foubert, A. Charley, A. Oak, D. Xu, W. Gillijns, J. Mitard, Z. Tokei, M. van der Veen, N. Heylen, L. Teugels, Q. T. Le, F. Schleicher, P. Leray, K. Ronse, Il Hwan Kim, Insung Kim, Changmin Park, Jisun Lee, Koungmin Ryu, P. De Schepper, J. Doise, M. Kocsis
Proceedings Volume 11609, 116090Q (2021) https://doi.org/10.1117/12.2584713
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Oxides, Metals, Extreme ultraviolet, Scanners, Scanning electron microscopy, Photoresist processing, Lithography, Line edge roughness

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 111770A (2019) https://doi.org/10.1117/12.2535821
KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers, High volume manufacturing, Critical dimension metrology, Inspection, Logic

Proceedings Article | 4 June 2019 Paper
Proceedings Volume 10957, 109571M (2019) https://doi.org/10.1117/12.2515418
KEYWORDS: Transistors, Logic, Extreme ultraviolet, Stochastic processes, Metals, Printing, Bridges, Semiconducting wafers, Optical lithography, Lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Danilo De Simone, Romuald Blanc, Jeroen Van de Kerkhove, Amir-Hossein Tamaddon, Roberto Fallica, Lieve Van Look, Nouredine Rassoul, Frederic Lazzarino, Nadia Vandenbroeck, Pieter Vanelderen, Gian Lorusso, Frieda Van Roey, Anne-Laure Charley, Geert Vandenberghe, Kurt Ronse, Kilyoung Lee, Junghyung Lee, Sarohan Park, Chang-Moon Lim, Chan-Ha Park
Proceedings Volume 10957, 109570T (2019) https://doi.org/10.1117/12.2515170
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Extreme ultraviolet, Critical dimension metrology, Image processing, Failure analysis, Scanning electron microscopy, Image analysis

Proceedings Article | 2 August 2018 Presentation + Paper
Shimon Levi, Ishai Swrtsband, Vladislav Kaplan, Ilan Englard, Kurt Ronse, Bogumila Kutrzeba-Kotowska , Gaoliang Dai, Frank Scholze, Kenslea Anne, Hayley Johanesen, Laurens Kwakman, Igor Turovets, Maxim Rabinovitch, Sven Krannich, Nikolai Kasper, Brid Connolly, Romy Wende, Markus Bender
Proceedings Volume 10585, 1058511 (2018) https://doi.org/10.1117/12.2297265
KEYWORDS: Metrology, Extreme ultraviolet, Photomasks, Semiconducting wafers, Signal processing, Transmission electron microscopy, Atomic force microscopy, Etching

Proceedings Article | 23 April 2018 Paper
Proceedings Volume 10583, 1058326 (2018) https://doi.org/10.1117/12.2297447
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Semiconductors, Lithography, Semiconducting wafers, Metals, Manufacturing, Double patterning technology, Photomasks

Proceedings Article | 23 March 2018 Presentation + Paper
Stéphane Larivière, Christopher Wilson, Bogumila Kutrzeba Kotowska, Janko Versluijs, Stefan Decoster, Ming Mao, Marleen van der Veen, Nicolas Jourdan, Zaid El-Mekki, Nancy Heylen, Els Kesters, Patrick Verdonck, Christophe Béral, Dieter Van den Heuvel, Peter De Bisschop, Joost Bekaert, Victor Blanco, Ivan Ciofi, Danny Wan, Basoene Briggs, Arindam Mallik, Eric Hendrickx, Ryoung-han Kim, Greg McIntyre, Kurt Ronse, Jürgen Bömmels, Zsolt Tőkei, Dan Mocuta
Proceedings Volume 10583, 105830U (2018) https://doi.org/10.1117/12.2299389
KEYWORDS: Extreme ultraviolet, Optical lithography, Etching, Tin, Resistance, Metals, Semiconducting wafers, Critical dimension metrology, Photomasks, Copper

Proceedings Article | 20 March 2018 Presentation + Paper
Ryoung-han Kim, Yasser Sherazi, Peter Debacker, Praveen Raghavan, Julien Ryckaert, Arindam Malik, Diederik Verkest, Jae Uk Lee, Werner Gillijns, Ling Ee Tan, Victor Blanco, Kurt Ronse, Greg McIntyre
Proceedings Volume 10588, 105880N (2018) https://doi.org/10.1117/12.2299335
KEYWORDS: Optical lithography, Extreme ultraviolet, Metals, Logic, Manufacturing, Lithography, Back end of line, Extreme ultraviolet lithography, New and emerging technologies

Proceedings Article | 28 March 2016 Paper
P. Raghavan, F. Firouzi, L. Matti, P. Debacker, R. Baert, S. M. Y. Sherazi, D. Trivkovic, V. Gerousis, M. Dusa, J. Ryckaert, Z. Tokei, D. Verkest, G. McIntyre, K. Ronse
Proceedings Volume 9781, 97810Q (2016) https://doi.org/10.1117/12.2238928
KEYWORDS: Metals, Optical lithography, Resistance, Extreme ultraviolet, Capacitance, Semiconducting wafers, Logic, Optical design, Copper, Photomasks

Proceedings Article | 16 April 2015 Paper
Arindam Mallik, Julien Ryckaert, Abdelkarim Mercha, Diederik Verkest, Kurt Ronse, Aaron Thean
Proceedings Volume 9422, 94221N (2015) https://doi.org/10.1117/12.2086085
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Surface plasmons, Extreme ultraviolet, Photomasks, Back end of line, Lithography, Metals, Semiconducting wafers, Semiconductors

Proceedings Article | 18 March 2015 Paper
W. Gillijns, S. M. Y. Sherazi, D. Trivkovic, B. Chava, B. Vandewalle, V. Gerousis, P. Raghavan, J. Ryckaert, K. Mercha, D. Verkest, G. McIntyre, K. Ronse
Proceedings Volume 9427, 942709 (2015) https://doi.org/10.1117/12.2085923
KEYWORDS: Metals, Photomasks, Semiconducting wafers, Lithography, Optical lithography, Standards development, Capacitance, Optical proximity correction, Scanning electron microscopy, Manufacturing

Proceedings Article | 18 March 2015 Paper
Julien Ryckaert, Praveen Raghavan, Pieter Schuddinck, Huynh Bao Trong, Arindam Mallik, Sushil Sakhare, Bharani Chava, Yasser Sherazi, Philippe Leray, Abdelkarim Mercha, Jürgen Bömmels, Gregory McIntyre, Kurt Ronse, Aaron Thean, Zsolt Tökei, An Steegen, Diederik Verkest
Proceedings Volume 9427, 94270C (2015) https://doi.org/10.1117/12.2178997
KEYWORDS: Optical lithography, Metals, Transistors, Standards development, Logic, Resistance, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Field effect transistors

Proceedings Article | 17 April 2014 Paper
Arindam Mallik, Naoto Horiguchi, Jürgen Bömmels, Aaron Thean, Kathy Barla, Geert Vandenberghe, Kurt Ronse, Julien Ryckaert, Abdelkarim Mercha, Laith Altimime, Diederik Verkest, An Steegen
Proceedings Volume 9048, 90481R (2014) https://doi.org/10.1117/12.2046310
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Lithography, Extreme ultraviolet, Semiconducting wafers, Semiconductors, Photomasks, Back end of line, Metals, Front end of line

Proceedings Article | 8 April 2013 Paper
Arindam Mallik, Wim Vansumere, Julien Ryckaert, Abdelkarim Mercha, Naoto Horiguchi, Steven Demuynck, Jürgen Bömmels, Tokei Zsolt, Geert Vandenberghe, Kurt Ronse, Aaron Thean, Diederik Verkest, Hans Lebon, An Steegen
Proceedings Volume 8679, 86792Y (2013) https://doi.org/10.1117/12.2011528
KEYWORDS: Semiconducting wafers, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Optical lithography, Semiconductors, Databases, Back end of line, 193nm lithography

Proceedings Article | 17 April 2012 Paper
Rik Jonckheere, Tobias Waehler, Bart Baudemprez, Uwe Dietze, Peter Dress, Oliver Brux, Kurt Ronse
Proceedings Volume 8352, 83520U (2012) https://doi.org/10.1117/12.923321
KEYWORDS: Reticles, Particles, Scanners, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Contamination, Inspection, Semiconducting wafers, Surface roughness

Proceedings Article | 14 October 2011 Paper
Rik Jonckheere, Dieter Van den Heuvel, Tristan Bret, Thorsten Hofmann, John Magana, Israel Aharonson, Doron Meshulach, Eric Hendrickx, Kurt Ronse
Proceedings Volume 8166, 81660E (2011) https://doi.org/10.1117/12.901555
KEYWORDS: Printing, Inspection, Reticles, Semiconducting wafers, Extreme ultraviolet, Bismuth, Atomic force microscopy, Photomasks, Wafer inspection, Visualization

Proceedings Article | 4 April 2011 Paper
Regina Freed, Jeff Sun, Alan Brodie, Paul Petric, Mark McCord, Kurt Ronse, Luc Haspeslagh, Bart Vereecke
Proceedings Volume 7970, 79701T (2011) https://doi.org/10.1117/12.879454
KEYWORDS: Electron beam lithography, Semiconducting wafers, Lithography, Electrodes, Mirrors, Microelectromechanical systems, Etching, Reflectivity, Electron beams, Tin

Proceedings Article | 2 April 2011 Paper
Rik Jonckheere, Dieter Van den Heuvel, Tristan Bret, Thorsten Hofmann, John Magana, Israel Aharonson, Doron Meshulach, Eric Hendrickx, Kurt Ronse
Proceedings Volume 7985, 79850W (2011) https://doi.org/10.1117/12.883854
KEYWORDS: Inspection, Printing, Photomasks, Reticles, Wafer inspection, Semiconducting wafers, Extreme ultraviolet, Visualization, Atomic force microscopy, Defect detection

Proceedings Article | 29 September 2010 Paper
Proceedings Volume 7823, 78231T (2010) https://doi.org/10.1117/12.865812
KEYWORDS: Reticles, Inspection, Printing, Bismuth, Photomasks, Semiconducting wafers, Defect detection, Wafer inspection, Extreme ultraviolet, Atomic force microscopy

Proceedings Article | 1 April 2010 Paper
Proceedings Volume 7637, 76370A (2010) https://doi.org/10.1117/12.852229
KEYWORDS: Lithography, Photomasks, Electron beam lithography, Manufacturing, Beam shaping, Semiconductors, Nanofabrication, Overlay metrology, Optical lithography, 193nm lithography

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790R (2009) https://doi.org/10.1117/12.824268
KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Printing, Wafer inspection, Inspection, Extreme ultraviolet, Scanning electron microscopy, Atomic force microscopy, Distortion

Proceedings Article | 4 December 2008 Paper
E. Hendrickx, A. Goethals, A. Niroomand, R. Jonckheere, F. Van Roey, G. Lorusso, J. Hermans, B. Baudemprez, K. Ronse
Proceedings Volume 7140, 714007 (2008) https://doi.org/10.1117/12.805408
KEYWORDS: Extreme ultraviolet, Reticles, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Line edge roughness, Critical dimension metrology, Lithography, Finite element methods, Printing

Proceedings Article | 28 March 2008 Paper
Rik Jonckheere, Yoonsuk Hyun, Fumio Iwamoto, Bart Baudemprez, Jan Hermans, Gian Francesco Lorusso, Ivan Pollentier, Anne-Marie Goethals, Kurt Ronse
Proceedings Volume 6921, 69211W (2008) https://doi.org/10.1117/12.771967
KEYWORDS: Carbon, Reflectivity, Photomasks, Extreme ultraviolet, Silicon, Ruthenium, Reticles, Printing, Extreme ultraviolet lithography, Oxidation

Proceedings Article | 21 March 2008 Paper
Hans Meiling, Edwin Boon, Nico Buzing, Kevin Cummings, Olav Frijns, Judy Galloway, Mieke Goethals, Noreen Harned, Bas Hultermans, Roel de Jonge, Bart Kessels, Peter Kürz, Sjoerd Lok, Martin Lowisch, Joerg Mallman, Bill Pierson, Kurt Ronse, James Ryan, Emil Smitt-Weaver, Michael Tittnich, Christian Wagner, Andre van Dijk, John Zimmerman
Proceedings Volume 6921, 69210L (2008) https://doi.org/10.1117/12.773259
KEYWORDS: Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Semiconducting wafers, Mirrors, Printing, Sensors, Stray light, Cameras, Reticles

Proceedings Article | 20 March 2008 Paper
T. Schmoeller, T. Klimpel, I. Kim, G. Lorusso, A. Myers, R. Jonckheere, A. Goethals, K. Ronse
Proceedings Volume 6921, 69211B (2008) https://doi.org/10.1117/12.772640
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Projection systems, Imaging systems, Near field, Extreme ultraviolet lithography, Lithography, Reflectivity, Lithographic illumination

Proceedings Article | 20 March 2008 Paper
G. Lorusso, J. Hermans, A. M. Goethals, B. Baudemprez, F. Van Roey, A. Myers, I. Kim, B. S. Kim, R. Jonckheere, A. Niroomand, S. Lok, A. Van Dijk, J.-F. de Marneffe, S. Demuynck, D. Goossens, K. Ronse
Proceedings Volume 6921, 69210O (2008) https://doi.org/10.1117/12.771983
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Etching, Photomasks, Manufacturing, Overlay metrology, Printing, Photoresist processing, Scanners

Proceedings Article | 30 October 2007 Paper
Rik Jonckheere, Fumio Iwamoto, G. Lorusso, A. Goethals, K. Ronse, H. Koop, T. Schmoeller
Proceedings Volume 6730, 673012 (2007) https://doi.org/10.1117/12.746566
KEYWORDS: Photomasks, Opacity, Carbon, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Waveguides, Printing

Proceedings Article | 11 May 2007 Paper
Rik Jonckheere, Gian Francesco Lorusso, Anne Marie Goethals, Jan Hermans, Bart Baudemprez, Alan Myers, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nickolay Stepanenko, Kurt Ronse
Proceedings Volume 6607, 66070H (2007) https://doi.org/10.1117/12.729259
KEYWORDS: Reticles, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Silicon, Multilayers, Carbon, Contamination, Point spread functions

Proceedings Article | 3 May 2007 Paper
R. Jonckheere, G. Lorusso, A. Goethals, K. Ronse, J. Hermans, R. De Ruyter
Proceedings Volume 6533, 653313 (2007) https://doi.org/10.1117/12.737179
KEYWORDS: Photomasks, Reticles, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Silicon, Multilayers, Lithography, Contamination, Manufacturing

Proceedings Article | 13 March 2007 Paper
Noreen Harned, Mieke Goethals, Rogier Groeneveld, Peter Kuerz, Martin Lowisch, Henk Meijer, Hans Meiling, Kurt Ronse, James Ryan, Michael Tittnich, Harm-Jan Voorma, John Zimmerman, Uwe Mickan, Sjoerd Lok
Proceedings Volume 6517, 651706 (2007) https://doi.org/10.1117/12.712065
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Photomasks, Reflectivity, Tin, Reliability

Proceedings Article | 13 March 2007 Paper
Anne Marie Goethals, Rik Jonckheere, Gian Francesco Lorusso, Jan Hermans, Frieda Van Roey, Alan Myers, Manish Chandhok, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nikolay Stepanenko, Roel Gronheid, Bart Baudemprez, Kurt Ronse
Proceedings Volume 6517, 651709 (2007) https://doi.org/10.1117/12.710798
KEYWORDS: Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Photomasks, Line edge roughness, Point spread functions, Scanners, Lithography, Printing, Critical dimension metrology

Proceedings Article | 16 June 2005 Paper
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637271
KEYWORDS: Photomasks, Immersion lithography, Polarization, Atrial fibrillation, Lithography, Critical dimension metrology, Reticles, Semiconducting wafers, Diffraction, 193nm lithography

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601012
KEYWORDS: Refractive index, Immersion lithography, Lithography, Polarization, Water, Image resolution, Imaging systems, Printing, Glasses, Absorption

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557803
KEYWORDS: Reticles, Resolution enhancement technologies, Printing, Lithography, Immersion lithography, Chromium, Electroluminescence, Semiconducting wafers, Photomasks, Critical dimension metrology

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536440
KEYWORDS: Oxygen, Contamination, Sensors, Projection systems, Relays, Semiconducting wafers, Spectroscopy, Nitrogen, Contamination control, Carbon monoxide

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536453
KEYWORDS: Reticles, Contamination, Photomasks, Vacuum ultraviolet, Oxygen, Semiconducting wafers, Adsorption, Ions, Scanners, Binary data

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537328
KEYWORDS: Scanners, Sensors, Modulation transfer functions, Semiconducting wafers, Lithography, Reticles, Spatial frequencies, Monochromatic aberrations, Organic materials, Control systems

Proceedings Article | 26 June 2003 Paper
Kurt Ronse, Peter De Bisschop, Astrid Eliat, Anne-Marie Goethals, Jan Hermans, Rik Jonckheere, Dieter Van Den Heuvel, Frieda Van Roey, Stephan Beckx, Johan Wouters, Jean-Francois de Marneffe, Timothy O'Neil, Bruce Tirri, Harry Sewell
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485513
KEYWORDS: Pellicles, Etching, Lithography, Reticles, Photomasks, Semiconducting wafers, Optical lithography, Silicon carbide, Contamination, Oxides

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485502
KEYWORDS: Electroluminescence, Printing, Resolution enhancement technologies, Photomasks, Lithography, Reticles, Optical lithography, Phase shifts, Lithographic illumination, Metrology

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485426
KEYWORDS: Photomasks, Lithography, Binary data, Optical lithography, Optical proximity correction, Logic, Scanning electron microscopy, Printing, Chromium, Diffraction

Proceedings Article | 27 December 2002 Paper
Eric Hendrickx, Geert Vandenberghe, Kurt Ronse, Albert Colina, Alex van der Hoff, Mircea Dusa, Jo Finders
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467912
KEYWORDS: Scanners, Data modeling, Diffraction, Monochromatic aberrations, Semiconducting wafers, Lithography, Lithographic illumination, Metrology, Overlay metrology, Scanning electron microscopy

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467915
KEYWORDS: Reticles, Critical dimension metrology, Semiconducting wafers, Electroluminescence, Photomasks, Optical proximity correction, 3D metrology, Cadmium, Resolution enhancement technologies, Photoresist processing

Proceedings Article | 16 August 2002 Paper
Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479350
KEYWORDS: Optical proximity correction, Photomasks, Lithography, Metrology, Image processing, Scanning electron microscopy, Semiconducting wafers, Image analysis, Transistors, Line edge roughness

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474588
KEYWORDS: Reticles, Optical proximity correction, Photomasks, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Optical lithography, Metrology, Printing, Logic

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474482
KEYWORDS: Photomasks, Nanoimprint lithography, Semiconducting wafers, Neodymium, Critical dimension metrology, Diffraction, Error analysis, Process control, Binary data, Optical lithography


Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458316
KEYWORDS: Photomasks, Optical proximity correction, Binary data, Reticles, Semiconducting wafers, Optical lithography, Logic, Resolution enhancement technologies, Scanning electron microscopy, Etching

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458259
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Monte Carlo methods, Nanoimprint lithography, Printing, Lithography, Resolution enhancement technologies, Binary data, Error analysis

Proceedings Article | 14 September 2001 Paper
Geert Vandenberghe, Young-Chang Kim, Christie Delvaux, Kevin Lucas, Sang-Jun Choi, Monique Ercken, Kurt Ronse, Bert Vleeming
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435718
KEYWORDS: Binary data, Photomasks, Diffraction, Optical proximity correction, Electroluminescence, Lithographic illumination, Optical lithography, Scanning electron microscopy, Printing, Lithography

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435736
KEYWORDS: Critical dimension metrology, Reticles, Monte Carlo methods, Diffraction, Lithography, Photomasks, Computer simulations, Optical proximity correction, Sodium, Optical lithography

Proceedings Article | 5 September 2001 Paper
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438345
KEYWORDS: Photomasks, Optical proximity correction, Reticles, Semiconducting wafers, Printing, 193nm lithography, Critical dimension metrology, Metrology, Lithography, Optical lithography

Proceedings Article | 5 September 2001 Paper
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438406
KEYWORDS: Photomasks, Phase shifts, Reticles, Semiconducting wafers, Etching, Binary data, Optical lithography, Cadmium sulfide, Lithography, Overlay metrology

Proceedings Article | 26 April 2001 Paper
Ivan Pollentier, Monique Ercken, Astrid Eliat, Christie Delvaux, Patrick Jaenen, Kurt Ronse
Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425235
KEYWORDS: Etching, Line edge roughness, 193nm lithography, Critical dimension metrology, Scanning electron microscopy, Lithography, Semiconducting wafers, Head-mounted displays, Monochromatic aberrations, Manufacturing

Proceedings Article | 26 April 2001 Paper
Mireille Maenhoudt, Diziana Van Goidsenhoven, Ivan Pollentier, Kurt Ronse, Muriel Lepage, Herbert Struyf, Marleen Van Hove
Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425203
KEYWORDS: Etching, Photomasks, Oxides, Dielectrics, Reflectivity, Lithography, Critical dimension metrology, Copper, Electroluminescence, Metals

Proceedings Article | 5 July 2000 Paper
Kurt Ronse, Geert Vandenberghe, Patrick Jaenen, Christie Delvaux, Diziana Vangoidsenhoven, Frieda Van Roey, Ingrid Pollers, Mireille Maenhoudt, Anne-Marie Goethals, Ivan Pollentier, Bert Vleeming, Koen van Ingen Schenau, Barbra Heskamp, Guy Davies, Jo Finders, Ardavan Niroomand
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389029
KEYWORDS: Lithography, 193nm lithography, Photomasks, Manufacturing, Etching, Reticles, Dry etching, Lenses, Oxides, Resolution enhancement technologies

Proceedings Article | 5 July 2000 Paper
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389002
KEYWORDS: Lithography, Reticles, Lithographic illumination, Scattering, Photomasks, Critical dimension metrology, Optical proximity correction, Binary data, Diffraction, Manufacturing

Proceedings Article | 5 July 2000 Paper
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389027
KEYWORDS: Critical dimension metrology, Photomasks, Reticles, Resolution enhancement technologies, 193nm lithography, Monte Carlo methods, Binary data, Lithographic illumination, Optical lithography, Lithography

Proceedings Article | 26 July 1999 Paper
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354406
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Standards development, Lithography, Chemistry, Metrology, Etching, Photoresist developing, Deep ultraviolet, Photoresist processing

Proceedings Article | 26 July 1999 Paper
Anne-Marie Goethals, Ingrid Pollers, Patrick Jaenen, Frieda Van Roey, Kurt Ronse, Barbra Heskamp, Guy Davies
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354340
KEYWORDS: Etching, Photoresist processing, Lithography, Scanners, Line edge roughness, Resistance, Scanning electron microscopy, Deep ultraviolet, Chemistry, Contamination

Proceedings Article | 26 July 1999 Paper
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354329
KEYWORDS: Data modeling, Lithography, Photoresist processing, Semiconducting wafers, Mathematical modeling, Wafer-level optics, Reticles, Data conversion, Image processing, Cadmium sulfide

Proceedings Article | 26 July 1999 Paper
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354336
KEYWORDS: Photomasks, Binary data, Optical proximity correction, Resolution enhancement technologies, Phase shifts, Semiconducting wafers, Reticles, SRAF, Lithography, Optical lithography

Proceedings Article | 26 July 1999 Paper
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354347
KEYWORDS: Critical dimension metrology, Reticles, Electroluminescence, Printing, Lithography, Lithographic illumination, Photomasks, 193nm lithography, Binary data, Resolution enhancement technologies

Proceedings Article | 26 July 1999 Paper
Anja Rosenbusch, Andrew Hourd, Casper Juffermans, Hartmut Kirsch, Frederic Lalanne, Wilhelm Maurer, Carmelo Romeo, Kurt Ronse, Patrick Schiavone, Michal Simecek, Olivier Toublan, Tom Vermeulen, John Watson, Wolfram Ziegler, Rainer Zimmermann
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354378
KEYWORDS: Optical proximity correction, Etching, Semiconducting wafers, Inspection, Deep ultraviolet, Reticles, Critical dimension metrology, Manufacturing, Mathematical modeling, Mask making

Proceedings Article | 14 June 1999 Paper
Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350870
KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Photomasks, Optical testing, Lithography, Etching, Algorithm development, Deep ultraviolet

Proceedings Article | 28 April 1999 Paper
Proceedings Volume 3741, (1999) https://doi.org/10.1117/12.346897
KEYWORDS: 193nm lithography, Lithography, Photomasks, Reticles, Manufacturing, Optical lithography, Resolution enhancement technologies, Deep ultraviolet, Phase shifts, Lenses

Proceedings Article | 18 December 1998 Paper
Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332839
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Reticles, Optical proximity correction, Mask making, Lithography, Image processing, Scanning electron microscopy, Scanners

Proceedings Article | 18 December 1998 Paper
Anja Rosenbusch, Andrew Hourd, Casper Juffermans, Hartmut Kirsch, Frederic Lalanne, Wilhelm Maurer, Carmelo Romeo, Kurt Ronse, Patrick Schiavone, Michal Simecek, Olivier Toublan, John Watson, Wolfram Ziegler, Rainer Zimmermann
Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332856
KEYWORDS: Optical proximity correction, Reticles, Photomasks, Inspection, Data modeling, Manufacturing, Deep ultraviolet, Logic, Semiconducting wafers, Etching

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310737
KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Reticles, Printing, Lithography, Imaging systems, Optical components, Nonlinear optics

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310789
KEYWORDS: Critical dimension metrology, Scanners, Reticles, Semiconducting wafers, Control systems, Lithography, Deep ultraviolet, Scanning electron microscopy, Manufacturing, Ions

Proceedings Article | 29 June 1998 Paper
Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen, Feng-Hong Zhang, Christie Delvaux, Paul Richardson, Ilse van Puyenbroeck, Kurt Ronse, James Lamb, Johan van der Hilst, Johannes van Wingerden
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310762
KEYWORDS: Critical dimension metrology, Etching, Reflectivity, Semiconducting wafers, Chlorine, Ions, Lithography, Photoresist processing, Absorption, Information operations

Proceedings Article | 28 July 1997 Paper
Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277300
KEYWORDS: Optical proximity correction, Lithography, Photomasks, Optical lithography, Reticles, Deep ultraviolet, Printing, Mask making, Data modeling, Optics manufacturing

Proceedings Article | 7 July 1997 Paper
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275990
KEYWORDS: Lithography, Optical proximity correction, Optical calibration, Deep ultraviolet, Printing

Proceedings Article | 7 July 1997 Paper
Maaike Op de Beeck, Kurt Ronse, Kouros Ghandehari, Patrick Jaenen, Harry Botermans, Jo Finders, John Lilygren, Daniel Baker, Geert Vandenberghe, Peter De Bisschop, Mireille Maenhoudt, Luc Van den Hove
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275973
KEYWORDS: Deep ultraviolet, Logic, Photoresist processing, Dry etching, Etching

Proceedings Article | 7 June 1996 Paper
Maaike Op de Beeck, Bert Bruggeman, Harry Botermans, Veerle Van Driessche, Anthony Yen, Alexander Tritchkov, Rik Jonckheere, Kurt Ronse, Luc Van den Hove
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240927
KEYWORDS: Etching, Optical proximity correction, Photomasks, Critical dimension metrology, Chlorine, Scanning electron microscopy, Deep ultraviolet, Silicon, Lithium, Photoresist processing

Proceedings Article | 7 June 1996 Paper
Anne-Marie Goethals, J. Vertommen, Frieda Van Roey, Anthony Yen, Alexander Tritchkov, Kurt Ronse, Rik Jonckheere, Luc Van den Hove
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240910
KEYWORDS: Optical proximity correction, Anisotropy, Lithography, Photoresist processing, Deep ultraviolet, Image processing, Reticles, Etching, Chemistry, Critical dimension metrology

Proceedings Article | 7 June 1996 Paper
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240924
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Lithography, Software development, Optical lithography, Scanning electron microscopy, Photoresist processing, Deep ultraviolet, Control systems

Proceedings Article | 26 May 1995 Paper
Rainer Pforr, Kurt Ronse, Luc Van den Hove, Anthony Yen, Shane Palmer, Gene Fuller, Oberdan Otto
Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209249
KEYWORDS: Optical proximity correction, Photomasks, Lithography, Critical dimension metrology, Electroluminescence, Phase shifts, Binary data, Cadmium, Lithographic illumination, Transparency

Proceedings Article | 17 May 1994 Paper
Rainer Pforr, Kurt Ronse, Patrick Jaenen, Rik Jonckheere, Luc Van den Hove, Peter van Oorschot, Paul Luehrmann
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175467
KEYWORDS: Photomasks, Aluminum, Phase shifts, Halftones, Lithographic illumination, Lithography, Electroluminescence, Logic, Semiconducting wafers, Chromium

Proceedings Article | 17 May 1994 Paper
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175476
KEYWORDS: Phase shifts, Photomasks, Lithography, Manufacturing, Transmittance, Deep ultraviolet, Phase measurement, Tolerancing, Optics manufacturing, Refractive index

Proceedings Article | 16 May 1994 Paper
Anne-Marie Goethals, Ki-Ho Baik, Kurt Ronse, J. Vertommen, Luc Van den Hove
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175355
KEYWORDS: Photoresist processing, Etching, Deep ultraviolet, Anisotropy, Silicon, Image processing, Picture Archiving and Communication System, Lithography, Photomasks, Printing

Proceedings Article | 15 September 1993 Paper
Ki-Ho Baik, Kurt Ronse, Luc Van den Hove, Bruno Roland
Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154765
KEYWORDS: Deep ultraviolet, Photomasks, Liquids, Silicon, Lithography, Photoresist processing, Phase shifting, Scanning electron microscopy, Image processing, Diffusion

Proceedings Article | 8 August 1993 Paper
Kurt Ronse, Rik Jonckheere, Casper Juffermans, Luc Van den Hove
Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150416
KEYWORDS: Photomasks, Halftones, Phase shifts, Phase shifting, Optical lithography, Semiconducting wafers, Transmittance, Mask making, Photoresist processing, Printing

Proceedings Article | 8 August 1993 Paper
Rainer Pforr, Rik Jonckheere, Wolfgang Henke, Kurt Ronse, Patrick Jaenen, Ki-Ho Baik, Luc Van den Hove
Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150424
KEYWORDS: Photomasks, Diffraction gratings, Optical lithography, Light sources, Diffraction, Glasses, Semiconducting wafers, Computer generated holography, Lithographic illumination, Phase shifts

Proceedings Article | 1 June 1992 Paper
Ki-Ho Baik, Kurt Ronse, Luc Van den Hove, Bruno Roland
Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59736
KEYWORDS: Liquids, Photomasks, Phase shifting, Silicon, Scanning electron microscopy, Diffusion, Image processing, Photoresist processing, Lithography, Head-mounted displays

Showing 5 of 97 publications
Proceedings Volume Editor (8)

SPIE Conference Volume | 26 November 2024

SPIE Conference Volume | 30 November 2023

SPIE Conference Volume | 9 December 2022

SPIE Conference Volume | 22 October 2021

SPIE Conference Volume | 20 October 2020

SPIE Conference Volume | 15 November 2019

SPIE Conference Volume | 23 November 2018

SPIE Conference Volume | 29 November 2017

Showing 5 of 8 publications
Conference Committee Involvement (27)
International Conference on Extreme Ultraviolet Lithography 2025
21 September 2025 | Monterey, California, United States
40th European Mask and Lithography Conference (EMLC 2025)
16 June 2025 | Dresden, Germany
International Conference on Extreme Ultraviolet Lithography 2024
30 September 2024 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2022
26 September 2022 | Monterey, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2021
27 September 2021 | Online Only, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
International Conference on Extreme Ultraviolet Lithography 2020
21 September 2020 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2019
16 September 2019 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2018
17 September 2018 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography
11 September 2017 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Optical Microlithography XVIII
1 March 2005 | San Jose, California, United States
Optical Microlithography XVII
24 February 2004 | Santa Clara, California, United States
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
Showing 5 of 27 Conference Committees
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