Mr. Kenji Hoshiko Profile

Kenji Hoshiko

at JSR Micro NV

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 6 April 2015 Paper

Novel EUV resist development for sub-14nm half pitch

Masafumi Hori, Takehiko Naruoka, Hisashi Nakagawa, Tomohisa Fujisawa, Takakazu Kimoto, Motohiro Shiratani, Tomoki Nagai, Ramakrishnan Ayothi, Yoshi Hishiro, Kenji Hoshiko, Toru Kimura

Proceedings Volume 9422, 94220P (2015) https://doi.org/10.1117/12.2085927

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Diffusion, Line width roughness, Lithography, Chemically amplified resists, Optical lithography, Chemical species, Semiconductor manufacturing, Semiconductors

Read Abstract +

Proceedings Article | 20 March 2015 Paper

XAS photoresists electron/quantum yields study with synchrotron light

Peter de Schepper, Alessandro Vaglio Pret, Terje Hansen, Angelo Giglia, Kenji Hoshiko, Antonio Mani, John Biafore

Proceedings Volume 9425, 942507 (2015) https://doi.org/10.1117/12.2085951

KEYWORDS: Electrons, Photoresist materials, Extreme ultraviolet lithography, Photons, Absorption, Fluorine, Synchrotrons, Semiconducting wafers, Polymers, Stochastic processes

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Novel EUV resist materials for 16nm half pitch and EUV resist defects

Motohiro Shiratani, Takehiko Naruoka, Ken Maruyama, Ramakrishnan Ayothi, Yoshi Hishiro, Kenji Hoshiko, Andreia Santos, Xavier Buch, Tooru Kimura

Proceedings Volume 9048, 90481D (2014) https://doi.org/10.1117/12.2046133

KEYWORDS: Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Lithography, Fluorine, Semiconducting wafers, Diffusion, Chemical species, Line edge roughness, Absorbance

Read Abstract +

Proceedings Article | 1 April 2013 Paper

Roughness and variability in EUV lithography: Who is to blame? (part 1)

Alessandro Vaglio Pret, Roel Gronheid, Todd Younkin, Gustaf Winroth, John Biafore, Yusuke Anno, Kenji Hoshiko, Vassilios Constantoudis

Proceedings Volume 8679, 86792O (2013) https://doi.org/10.1117/12.2011584

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Scanners, Stochastic processes, Nanoimprint lithography, Lithography, Metrology, Photoresist processing, Computer simulations, Extreme ultraviolet

Read Abstract +

Proceedings Article | 31 March 2010 Paper

Simplified "Litho-Cluster-Only" solution for double patterning

H. Tanaka, K. Hoshiko, T. Shimokawa, H. Hoefnagels, D. Keller, S. Wang, O. Tanriseven, R. Maas, J. Mallman, K. Shigemori, C. Rosslee

Proceedings Volume 7639, 76391V (2010) https://doi.org/10.1117/12.848462

KEYWORDS: Double patterning technology, Semiconducting wafers, Optical alignment, Scanning electron microscopy, Sensors, Reticles, Lithography, Signal processing, Optical lithography, Photoresist processing

Read Abstract +

Proceedings Article | 30 March 2010 Paper

Point-of-use filtration methods to reduce defectivity

Jennifer Braggin, Wim Schoallert, Kenji Hoshiko, Xavier Buch

Proceedings Volume 7639, 763918 (2010) https://doi.org/10.1117/12.846346

KEYWORDS: Semiconducting wafers, Chemistry, Composites, Manufacturing, Photoresist processing, Coating, Particles, Immersion lithography, Digital watermarking, Manufacturing equipment

Read Abstract +

Proceedings Article | 26 March 2010 Paper

Simplified double patterning process with non-topcoat self-freezing resist

Tomohisa Fujisawa, Yusuke Anno, Masafumi Hori, Goji Wakamatsu, Michihiro Mita, Koji Ito, Hiromitsu Tanaka, Kenji Hoshiko, Takeo Shioya, Kentaro Goto, Yoshifumi Ogawa, Hiroaki Takikawa, Yutaka Kozuma, Koichi Fujiwara, Makoto Sugiura, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 7639, 76392Y (2010) https://doi.org/10.1117/12.846493

KEYWORDS: Double patterning technology, Photoresist processing, Lithography, Manufacturing, Optical lithography, Silica, Water, Immersion lithography, Critical dimension metrology, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Double patterning process with freezing technique

Goji Wakamatsu, Yusuke Anno, Masafumi Hori, Tomohiro Kakizawa, Michihiro Mita, Kenji Hoshiko, Takeo Shioya, Koichi Fujiwara, Shiro Kusumoto, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 7273, 72730B (2009) https://doi.org/10.1117/12.814073

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Manufacturing, Etching, Semiconducting wafers, Scanning electron microscopy, Image processing, Photomasks

Read Abstract +

Proceedings Article | 11 April 2006 Paper

Immersion topcoat and resist material improvement study by using immersion scanner

Hiroki Nakagawa, Kenji Hoshiko, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa, Katsushi Nakano, Tomoharu Fujiwara, Soichi Owa

Proceedings Volume 6153, 61530D (2006) https://doi.org/10.1117/12.655541

KEYWORDS: Semiconducting wafers, Scanners, Water, Lithography, Immersion lithography, Resonance energy transfer, Photoresist processing, Photoresist materials, Silicon, Chemical analysis

Read Abstract +

Showing 5 of 9 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years