Dr. Ramakrishnan Ayothi Profile

Dr. Ramakrishnan Ayothi

Sr. Manager - Lithography Research at JSR Micro Inc

SPIE Involvement:

Conference Program Committee | Author

Publications (16)

Proceedings Article | 22 February 2021 Open Access

JSR Micro, Inc.: JSR patterning materials for semiconductor manufacturing

Ramakrishnan Ayothi

Proceedings Volume 11669, 1166904 (2021) https://doi.org/10.1117/12.2592994

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Proceedings Article | 18 September 2020 Presentation

JSR Micro, Inc.: JSR patterning and process materials for semiconductor manufacturing

Ramakrishnan Ayothi

Proceedings Volume PV20EX, PV20EX01 (2020) https://doi.org/10.1117/12.2583886

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Proceedings Article | 23 March 2020 Paper

Stochastic effects on EUV CAR systems: investigation of materials impact

Katsuaki Nishikori, Kazuki Kasahara, Tetsurou Kaneko, Tomohiko Sakurai, Satoshi Dei, Ken Maruyama, Ramakrishnan Ayothi

Proceedings Volume 11326, 1132612 (2020) https://doi.org/10.1117/12.2551968

KEYWORDS: Stochastic processes, Polymers, Extreme ultraviolet lithography, Quantum efficiency

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Proceedings Article | 9 April 2018 Presentation + Paper

Polymer brush as adhesion promoter for EUV patterning

Jing Guo, Anuja De Silva, Yann Mignot, Yongan Xu, Abraham Arceo de la Pena, Luciana Meli, Indira Seshadri, Dominik Metzler, Lovejeet Singh, Tsuyoshi Furukawa, Ramakrishnan Ayothi, Nelson Felix, Dan Corliss

Proceedings Volume 10586, 105860I (2018) https://doi.org/10.1117/12.2297113

KEYWORDS: Chemistry, Polymers, Printing, Etching, Optical lithography, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Dielectrics, Semiconducting wafers

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SPIE Journal Paper | 28 August 2017

Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer

Indira Seshadri, Anuja De Silva, Luciana Meli, Chi-Chun Charlie Liu, Cheng Chi, Jing Guo, Hoa Truong, Kristin Schmidt, John Arnold, Nelson Felix, Lovejeet Singh, Tsuyoshi Furukawa, Ramakrishnan Ayothi, Angelique Raley, Richard Farrell

JM3, Vol. 16, Issue 03, 033506, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033506

KEYWORDS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing

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Proceedings Article | 5 May 2017 Presentation

Novel EUV photoresist for sub-7nm node (Conference Presentation)

Tsuyoshi Furukawa, Takehiko Naruoka, Hisashi Nakagawa, Hiromu Miyata, Motohiro Shiratani, Masafumi Hori, Satoshi Dei, Ramakrishnan Ayothi, Yoshi Hishiro, Tomoki Nagai

Proceedings Volume 10143, 101430X (2017) https://doi.org/10.1117/12.2258164

KEYWORDS: Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line width roughness, High volume manufacturing, Photoresist processing, Lithography, Semiconductor manufacturing, Semiconductors, Line edge roughness

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Proceedings Article | 24 March 2017 Presentation + Paper

Single-expose patterning development for EUV lithography

Anuja De Silva, Karen Petrillo, Luciana Meli, Jeffrey Shearer, Genevieve Beique, Lei Sun, Indira Seshadri, Taehwan Oh, Seulgi Han, Nicole Saulnier, Joe Lee, John Arnold, Bassem Hamieh, Nelson Felix, Tsuyoshi Furukawa, Lovejeet Singh, Ramakrishnan Ayothi

Proceedings Volume 10143, 101431G (2017) https://doi.org/10.1117/12.2261216

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Materials processing, Photoresist processing, Etching, Metals, Quantum efficiency, Photoresist materials, Interfaces, Silicon

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Proceedings Article | 24 March 2017 Presentation + Paper

Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer

Indira Seshadri, Anuja De Silva, Luciana Meli, Charlie Liu, Cheng Chi, Jing Guo, Kristin Schmidt, Hoa Truang, John Arnold, Nelson Felix, Lovejeet Singh, Tsuyoshi Furukawa, Ramakrishnan Ayothi, Angelique Raley, Richard Farrell

Proceedings Volume 10143, 101431D (2017) https://doi.org/10.1117/12.2258565

KEYWORDS: Extreme ultraviolet, Optical lithography, Polymers, Etching, Extreme ultraviolet lithography, Photoresist materials, Lithography, Photoresist processing, Back end of line, Oxides, Head-mounted displays, Atomic layer deposition, Chemistry

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Proceedings Article | 6 April 2015 Paper

Novel EUV resist development for sub-14nm half pitch

Masafumi Hori, Takehiko Naruoka, Hisashi Nakagawa, Tomohisa Fujisawa, Takakazu Kimoto, Motohiro Shiratani, Tomoki Nagai, Ramakrishnan Ayothi, Yoshi Hishiro, Kenji Hoshiko, Toru Kimura

Proceedings Volume 9422, 94220P (2015) https://doi.org/10.1117/12.2085927

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Diffusion, Line width roughness, Lithography, Chemically amplified resists, Optical lithography, Chemical species, Semiconductor manufacturing, Semiconductors

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Proceedings Article | 16 March 2015 Paper

First results of outgas resist family test and correlation between outgas specifications and EUV resist development

Yu-Jen Fan, Ken Maruyama, Ramakrishnan Ayothi, Takehiko Naruoka, Tonmoy Chakraborty, Dominic Ashworth, Jun Sung Chun, Cecilia Montgomery, Shih-Hui Jen, Mark Neisser, Kevin Cummings

Proceedings Volume 9422, 942211 (2015) https://doi.org/10.1117/12.2087424

KEYWORDS: Extreme ultraviolet, Contamination, Extreme ultraviolet lithography, Chemically amplified resists, Line edge roughness, Semiconducting wafers, Line width roughness, Reflectivity, Hydrogen, Critical dimension metrology

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Proceedings Article | 17 April 2014 Paper

Novel EUV resist materials for 16nm half pitch and EUV resist defects

Motohiro Shiratani, Takehiko Naruoka, Ken Maruyama, Ramakrishnan Ayothi, Yoshi Hishiro, Kenji Hoshiko, Andreia Santos, Xavier Buch, Tooru Kimura

Proceedings Volume 9048, 90481D (2014) https://doi.org/10.1117/12.2046133

KEYWORDS: Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Lithography, Fluorine, Semiconducting wafers, Diffusion, Chemical species, Line edge roughness, Absorbance

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Proceedings Article | 10 April 2013 Paper

3D AFM method for characterization of resist effect of aerial image contrast on side wall roughness

Yong-ha Lee, Sang-Joon Cho, Sang-il Park, R. Ayothi, Y. Hishiro

Proceedings Volume 8681, 86812Y (2013) https://doi.org/10.1117/12.2013657

KEYWORDS: Line edge roughness, Photoresist materials, Atomic force microscopy, Line width roughness, Scanning electron microscopy, 3D image processing, 3D scanning, Scanners, Laser scanners, Semiconductors

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Proceedings Article | 29 March 2013 Paper

Novel EUV resist materials and process for 20nm half pitch and beyond

Ken Maruyama, Ramakrishnan Ayothi, Yoshi Hishiro, Koji Inukai, Motohiro Shiratani, Tooru Kimura

Proceedings Volume 8682, 86820B (2013) https://doi.org/10.1117/12.2011243

KEYWORDS: Extreme ultraviolet, Silicon, Absorption, Diffusion, Extreme ultraviolet lithography, Line width roughness, Lithography, Photomasks, Optical lithography, Scanning electron microscopy

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Proceedings Article | 26 March 2008 Paper

Ionic photo-acid generators containing functionalized semifluorinated sulfonates for high-resolution lithography

Yi Yi, Ramakrishnan Ayothi, Christopher Ober, Wang Yueh, Heidi Cao

Proceedings Volume 6923, 69231B (2008) https://doi.org/10.1117/12.772880

KEYWORDS: Polymers, Lithography, Extreme ultraviolet lithography, Diffusion, Line edge roughness, Absorption, Extreme ultraviolet, Electron beam lithography, Transparency, Photoresist materials

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Proceedings Article | 29 March 2006 Paper

Molecular glass resists for next generation lithography

Daniel Bratton, Ramakrishnan Ayothi, Nelson Felix, Heidi Cao, Hai Deng, Christopher Ober

Proceedings Volume 6153, 61531D (2006) https://doi.org/10.1117/12.656630

KEYWORDS: Glasses, Lithography, Bridges, Electron beam lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Line edge roughness, Magnesium, FT-IR spectroscopy

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Proceedings Article | 29 March 2006 Paper

All-organic non-PFOS nonionic photoacid generating compounds with functionalized fluoroorganic sulfonate motif for chemically amplified resists

Ramakrishnan Ayothi, Yi Yi, Christopher Ober, Steve Putna, Wang Yueh, Heidi Cao

Proceedings Volume 6153, 61530J (2006) https://doi.org/10.1117/12.656500

KEYWORDS: Lithography, Line edge roughness, Electron beam lithography, Chromophores, Carbon, Fluorine, Absorption, Polymers, Scanning electron microscopy, Chemically amplified resists

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Showing 5 of 16 publications

Conference Committee Involvement (16)

Advances in Patterning Materials and Processes XLII

24 February 2025 | San Jose, California, United States

Advances in Patterning Materials and Processes XLI

26 February 2024 | San Jose, California, United States

Advances in Patterning Materials and Processes XL

27 February 2023 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIX

25 April 2022 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXVIII

22 February 2021 | Online Only, California, United States

Advances in Patterning Materials and Processes XXXVII

24 February 2020 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXVI

25 February 2019 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXV

27 February 2018 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIV

28 February 2017 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIII

29 February 2016 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXII

24 February 2015 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXI

24 February 2014 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXX

25 February 2013 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXIX

13 February 2012 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXVIII

28 February 2011 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXVII

22 February 2010 | San Jose, California, United States

Showing 5 of 16 Conference Committees

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