Mr. Mamoru Terai Profile

Mamoru Terai

Head Researcher at Mitsubishi Electric Corp

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Publications (8)

Proceedings Article | 1 April 2009 Paper

Defect reduction in non-topcoat resist by selective segregation removal step

Takuya Hagiwara, Mamoru Terai, Takeo Ishibashi, Tomofumi Miyauchi, Shinya Hori, Teruhiko Kumada, Tomoya Kumagai, Atsushi Sawano, Kosuke Doi, Takeshi Matsunobe, Naoki Man, Hirofumi Seki, Yusaku Tanahashi, Tetsuro Hanawa

Proceedings Volume 7273, 727324 (2009) https://doi.org/10.1117/12.813643

KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Lithography, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Scanners

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Proceedings Article | 26 March 2008 Paper

Improvements of adhesion and hydrophobicity of wafer bevel in water immersion lithography

Takeo Ishibash, Mamoru Terai, Takuya Hagiwara, Teruhiko Kumada, Tetsuro Hanawa, Yoko Takebe, Osamu Yokokoji, Tomoharu Fujiwara, Hiroshi Akiyama

Proceedings Volume 6923, 69231V (2008) https://doi.org/10.1117/12.771794

KEYWORDS: Semiconducting wafers, Coating, Silicon, Head-mounted displays, Immersion lithography, Manufacturing, Fluorine, Particles, Calcium, Prototyping

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Proceedings Article | 7 March 2008 Paper

Double patterning using dual spin-on Si containing layers with multilayer hard mask process

Mamoru Terai, Takeo Ishibashi, Masaaki Shinohara, Kazumasa Yonekura, Takuya Hagiwara, Tetsuro Hanawa, Teruhiko Kumada

Proceedings Volume 6924, 692420 (2008) https://doi.org/10.1117/12.771855

KEYWORDS: Etching, Double patterning technology, Silicon, Optical lithography, Coating, Photomasks, FT-IR spectroscopy, Photoresist processing, Silica, Scanning electron microscopy

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Proceedings Article | 2 April 2007 Paper

Mechanism of immersion specific defects with high receding-angle topcoat

Mamoru Terai, Teruhiko Kumada, Takeo Ishibashi, Takuya Hagiwara, Tetsuro Hanawa, Tomoyuki Ando, Takeshi Matsunobe, Kazuyuki Okada, Yuichi Muraji, Kazuhiro Yoshikawa, Naoki Man

Proceedings Volume 6519, 65191S (2007) https://doi.org/10.1117/12.711058

KEYWORDS: Water, Bridges, Immersion lithography, Semiconducting wafers, Digital watermarking, Surface properties, Polymers, Chemical analysis, Defect inspection, Standards development

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Proceedings Article | 11 April 2006 Paper

Studies on immersion defects using mimic immersion experiments

Tetsuro Hanawa, Toshifumi Suganaga, Takeo Ishibashi, Shinroku Maejima, Koichiro Narimatsu, Kazuyuki Suko, Mamoru Terai, Teruhiko Kumada, Junichi Kitano

Proceedings Volume 6153, 61531O (2006) https://doi.org/10.1117/12.655568

KEYWORDS: Thin film coatings, Immersion lithography, Lithography, Semiconducting wafers, Scanners, Photoresist processing, Contamination, Defect inspection, Chemical analysis, Absorption

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Proceedings Article | 29 March 2006 Paper

Studies of the mechanism for immersion specific defects

Takeo Ishibashi, Tetsuro Hanawa, Toshifumi Suganaga, Koichiro Narimatsu, Kazuyuki Suko, Mamoru Terai, Teruhiko Kumada, Tomoyuki Ando

Proceedings Volume 6153, 61533I (2006) https://doi.org/10.1117/12.654756

KEYWORDS: Ions, Semiconducting wafers, Chemical analysis, Statistical analysis, Immersion lithography, Technetium, Contamination, Photoresist processing, Adsorption, Neodymium

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Proceedings Article | 29 March 2006 Paper

Newly developed RELACS materials and process for 65 nm nodes

Mamoru Terai, Teruhiko Kumada, Takeo Ishibashi, Tetsuro Hanawa, Noboru Satake, Yusuke Takano

Proceedings Volume 6153, 61532I (2006) https://doi.org/10.1117/12.651242

KEYWORDS: Semiconducting wafers, Lithography, Etching, Photoresist processing, Polymers, Materials processing, Resolution enhancement technologies, Resistance, Optical lithography, Photomasks

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Proceedings Article | 12 June 2003 Paper

Below 70-nm contact hole pattern with RELACS process on ArF resist

Mamoru Terai, Toshiyuki Toyoshima, Takeo Ishibashi, Shinji Tarutani, Kiyohisa Takahashi, Yusuke Takano, Hatsuyuki Tanaka

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485167

KEYWORDS: Photoresist processing, Lithography, Semiconducting wafers, Image processing, Photomasks, Scanning electron microscopy, Polymers, Resolution enhancement technologies, Optical lithography, 193nm lithography

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Showing 5 of 8 publications

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