Prof. Xiangzhao Wang Profile

Prof. Xiangzhao Wang

Professor at Shanghai Institute of Optics And Fine Mechanics

SPIE Involvement:

Conference Program Committee | Author

Publications (98)

Proceedings Article | 24 November 2023 Paper

Simulation analysis of thermally induced deformation on reticle for deep ultraviolet lithography

Yisha Cao, Yunjun Lu, Peng Feng, Rong Su, Xiangzhao Wang

Proceedings Volume 12935, 1293559 (2023) https://doi.org/10.1117/12.3008409

KEYWORDS: Reticles, Thermal deformation, Deformation, Light sources, Lithography, Optical gratings, Light sources and illumination, Deep ultraviolet, Integrating spheres, Glasses

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Proceedings Article | 24 November 2023 Paper

Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images

Longqaio Zhang, Sikun Li, Hang Zheng, Shuai Yuan, Xiangzhao Wang

Proceedings Volume 12935, 129353D (2023) https://doi.org/10.1117/12.3007756

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Phase reconstruction, Image analysis

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Proceedings Article | 24 November 2023 Paper

Multilayer defect compensation based on three dimensional absorber correction in EUV lithography

Zheng Hang, Sikun Li, Dongchao Pang, Longqiao Zhang, Shuai Yuan, Xiangzhao Wang

Proceedings Volume 12935, 129354E (2023) https://doi.org/10.1117/12.3007995

KEYWORDS: Printing, 3D mask effects, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet, Simulations, Diffraction, Deformation, 3D image processing, Reflection, Phase compensation

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SPIE Journal Paper | 11 March 2023

Fast measurement of wavefront aberration in double-grating Ronchi lateral shearing interferometry

Yunjun Lu, Feng Tang, Zhongliang Li, Xiangzhao Wang

OE, Vol. 62, Issue 03, 034105, (March 2023) https://doi.org/10.1117/12.10.1117/1.OE.62.3.034105

KEYWORDS: Phase shifts, Ronchi rulings, Wavefront errors, Wavefronts, Wavefront aberrations, Diffraction, Interferometry, Interferograms, Optical engineering, Optical gratings

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Proceedings Article | 27 March 2022 Paper

Theoretical analysis of retrace error in Fizeau interferometer for deformed optical flats

Xiangyu Wei, Rong Su, Feng Tang, Xiangzhao Wang

Proceedings Volume 12169, 12169AY (2022) https://doi.org/10.1117/12.2626352

KEYWORDS: Fizeau interferometers, Semiconducting wafers, Monochromatic aberrations, Error analysis, Silicon, Wafer-level optics, Zernike polynomials, Wavefronts, Ray tracing, Interferometers

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SPIE Journal Paper | 14 December 2021

Measurement of the magnification and distortion of high-precision imaging system using dual-fiber point diffraction interferometer

Yisha Cao, Feng Tang, Xiangzhao Wang, Yang Liu, Peng Feng, Yunjun Lu, Fudong Guo

OE, Vol. 60, Issue 12, 124107, (December 2021) https://doi.org/10.1117/12.10.1117/1.OE.60.12.124107

KEYWORDS: Distortion, Imaging systems, Reticles, Error analysis, Diffraction, Optical fibers, Wavefront aberrations, Point diffraction interferometers, Optical engineering, Nickel

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Proceedings Article | 1 November 2021 Paper

A scanner matching method based on covariance matrix adaptation evolution strategy

Yuguang Chen, Sikun Li, Shaobo Hu, Guodong Chen, Ming Tang, Weijie Shi, Xiangzhao Wang

Proceedings Volume 12057, 120572F (2021) https://doi.org/10.1117/12.2605879

KEYWORDS: Scanners, Particle swarm optimization, Lithography, Lithographic illumination, Particles, Computer simulations, Optimization (mathematics), Genetic algorithms, Resolution enhancement technologies, Photomasks

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Proceedings Article | 9 October 2021 Poster + Paper

Spatial characteristics of spectral intensity of laser induced plasma

Chenwei Sun, Yang Bu, Yuanhang Wang, Fang Wu, Yachao Cai, Xiangzhao Wang

Proceedings Volume 11904, 119041C (2021) https://doi.org/10.1117/12.2602775

KEYWORDS: Plasma, Optical simulations, Electrons, Particles, Ions, Laser induced breakdown spectroscopy, Signal detection, Laser ablation, Ionization, Aluminum

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Proceedings Article | 9 October 2021 Poster + Paper

Design and analysis of bilayer metallic grating polarizer with tapered slits in deep ultraviolet band

Fang Wu, Yang Bu, Fanchun Tang, Xiangzhao Wang

Proceedings Volume 11903, 119031I (2021) https://doi.org/10.1117/12.2602787

KEYWORDS: Metals, Dielectrics, Dielectric polarization, Polarizers, Optical design, Modulation, Deep ultraviolet, Tolerancing, Diffraction gratings

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Proceedings Article | 9 October 2021 Poster + Paper

Measurement of phase retardation and fast axis of a quarter-wave plate using vector beams and Fourier analysis

Fanchun Tang, Yang Bu, Fang Wu, Xiangzhao Wang

Proceedings Volume 11899, 118991A (2021) https://doi.org/10.1117/12.2602802

KEYWORDS: Phase measurement, Phase shift keying, Modulation, Wave plates, Beam analyzers, Polarimetry, Charge-coupled devices, Polarizers, Radon transform, Light sources

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Proceedings Article | 9 October 2021 Poster + Paper

Detection of electrolyte elements in human blood based on laser-induced breakdown spectroscopy

Yuanhang Wang, Yang Bu, Yachao Cai, Xiangzhao Wang

Proceedings Volume 11900, 1190032 (2021) https://doi.org/10.1117/12.2602525

KEYWORDS: Laser induced breakdown spectroscopy, Sodium, Liquids, Blood, Potassium, Wavelet transforms, Plasma, Laser spectroscopy

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Proceedings Article | 15 January 2021 Paper

An optimized depth-resolved dispersion compensation method in optical coherent tomography signal processing

Xi Zhang, Zhongliang Li, Nan Nan, Xiangzhao Wang

Proceedings Volume 11761, 117610S (2021) https://doi.org/10.1117/12.2586792

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Proceedings Article | 15 January 2021 Paper

Epidermal layer recognition of optical coherence tomography skin images

Chenming Yang, Zhongliang Li, Nan Nan, Yang Bu, Xiangzhao Wang

Proceedings Volume 11761, 117610P (2021) https://doi.org/10.1117/12.2586659

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Proceedings Article | 10 October 2020 Presentation + Paper

FFT wavefront reconstruction algorithm with periodical extension for lateral shearing interferometry

Peng Li, Feng Tang, Xiangzhao Wang

Proceedings Volume 11552, 1155203 (2020) https://doi.org/10.1117/12.2573639

KEYWORDS: Reconstruction algorithms, Wavefronts, Wavefront reconstruction, Interferometry, Error analysis, Shearing interferometers, Fourier transforms, Computer simulations

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SPIE Journal Paper | 26 September 2020

Calibration method of shear amount based on the optical layout of point source microscope for lateral shearing interferometric wavefront sensor

Changzhe Peng, Feng Tang, Xiangzhao Wang, Jie Li

OE, Vol. 59, Issue 09, 094106, (September 2020) https://doi.org/10.1117/12.10.1117/1.OE.59.9.094106

KEYWORDS: Calibration, Wavefront sensors, Wavefronts, Diffraction gratings, Diffraction, Sensors, Optical engineering, Interferometry, Sensor calibration, Phase retrieval

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SPIE Journal Paper | 31 March 2020

Relationship between shear ratio and reconstruction accuracy in lateral shearing interferometry

Peng Li, Feng Tang, Xiangzhao Wang

OE, Vol. 59, Issue 03, 034113, (March 2020) https://doi.org/10.1117/12.10.1117/1.OE.59.3.034113

KEYWORDS: Wavefronts, Interferometry, Signal to noise ratio, Zernike polynomials, Optical engineering, Error analysis, Wavefront reconstruction, Reconstruction algorithms, Lithium, Dynamical systems

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Proceedings Article | 18 December 2019 Paper

Research on LIBS quantitative analysis of heavy metal concentration in polluted water-based on Fourier self-deconvolution method

Yuanhang Wang, Yang Bu, Fang Wu, Yi Cao, Yingjie Yu, Xiangzhao Wang

Proceedings Volume 11337, 113370P (2019) https://doi.org/10.1117/12.2544699

KEYWORDS: Lead, Laser induced breakdown spectroscopy, Metals, Quantitative analysis, Liquids, Chemical elements, Plasma, Deconvolution

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SPIE Journal Paper | 31 May 2019

Measuring cone angle of axicon using scanning Fizeau interferometer

Yan Yan, Feng Tang, Xiangzhao Wang, Yunjun Lu, Fudong Guo

OE, Vol. 58, Issue 05, 054107, (May 2019) https://doi.org/10.1117/12.10.1117/1.OE.58.5.054107

KEYWORDS: Axicons, Interferometers, Fizeau interferometers, Calibration, Error analysis, Optical engineering, Distance measurement, Interferometry, Phase shifts, Light sources

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SPIE Journal Paper | 27 February 2019 Open Access

Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (Erratum)

Heng Zhang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, Wei Cheng

JM3, Vol. 18, Issue 01, 019801, (February 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.019801

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithium, EUV optics, Mechanics

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SPIE Journal Paper | 24 January 2019

Predictor of thermal aberrations via particle filter for online compensation

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Weijie Shi, Yang Bu, Xiangzhao Wang

JM3, Vol. 18, Issue 01, 013502, (January 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.013502

KEYWORDS: Particle filters, Filtering (signal processing), Thermal modeling, Particles, Semiconducting wafers, Projection systems, Lithography, Photomasks, Data modeling, Calibration

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SPIE Journal Paper | 3 December 2018

Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy

Heng Zhang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, Wei Cheng

JM3, Vol. 17, Issue 04, 043505, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043505

KEYWORDS: Photomasks, Optimization (mathematics), Extreme ultraviolet lithography, Computer programming, Computer simulations, Evolutionary algorithms, Lithography, Manufacturing, Lithium, High volume manufacturing

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Proceedings Article | 2 November 2018 Paper

Digital sinusoidal fringe generation with defocusing for profilometry: exponential binary vs squared binary patterns

Abel Kamagara, Xiangzhao Wang, Sikun Li, Changzhe Peng

Proceedings Volume 10819, 108190V (2018) https://doi.org/10.1117/12.2500179

KEYWORDS: Binary data, Fringe analysis, Projection systems, Gaussian filters, 3D metrology, Phase shifts, Error analysis, Phase measurement, 3D image processing

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Proceedings Article | 2 November 2018 Paper

Compact lateral shearing interferometer based on circular modified Hartmann mask

Changzhe Peng, Feng Tang, Xiangzhao Wang, Abel Kamagara, Jie Li

Proceedings Volume 10819, 108190M (2018) https://doi.org/10.1117/12.2501010

KEYWORDS: Diffraction gratings, Diffraction, Shearing interferometers, Wavefronts, Wavefront sensors, Interferometers

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Proceedings Article | 9 August 2018 Paper

Sparse and adaptive fringe-enhancement efficiency analysis in 3D optical digital fringe-projection imaging

Abel Kamagara, Xiangzhao Wang, Sikun Li, Changzhe Peng

Proceedings Volume 10806, 108063H (2018) https://doi.org/10.1117/12.2502876

KEYWORDS: Fringe analysis, Image enhancement, 3D image processing, Phase shifts, 3D metrology, Adaptive optics, Image filtering, Digital filtering, Reconstruction algorithms, Image processing

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SPIE Journal Paper | 11 April 2018

Modeling and optimization of lens heating effect for lithographic projector

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Yang Bu, Xiangzhao Wang

JM3, Vol. 17, Issue 02, 023501, (April 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.2.023501

KEYWORDS: Projection systems, Lithography, Optical components, Optimization (mathematics), Thermal modeling, Refractive index, Photomasks, Optical design, Lithographic illumination, Thermography

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SPIE Journal Paper | 21 March 2018

Nonlinear gamma correction via normed bicoherence minimization in optical fringe projection metrology

Abel Kamagara, Xiangzhao Wang, Sikun Li

OE, Vol. 57, Issue 03, 034107, (March 2018) https://doi.org/10.1117/12.10.1117/1.OE.57.3.034107

KEYWORDS: Fringe analysis, Projection systems, Calibration, Lithium, Nonlinear optics, Metrology, Optical engineering, Statistical analysis, Coherence (optics), 3D metrology

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Proceedings Article | 20 March 2018 Paper

Prediction of lens heating induced aberration via particle filter in optical lithography

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Weijie Shi, Yang Bu, Xiangzhao Wang

Proceedings Volume 10587, 105871K (2018) https://doi.org/10.1117/12.2297338

KEYWORDS: Particle filters, Semiconducting wafers, Lithography, Thermal modeling, Projection systems, Data modeling, Optical lithography, Manufacturing

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Proceedings Article | 10 January 2018 Paper

A method for improving the measurement accuracy of lateral shearing interferometry

Jie Li, Feng Tang, Xiangzhao Wang, Rongsheng Ba, Xinda Zhou, Yinbo Zheng, Lei Ding, Bo Chen, Xiaoyu Yang, Jing Yuan

Proceedings Volume 10618, 106180P (2018) https://doi.org/10.1117/12.2286323

KEYWORDS: Wavefronts, Sensors, Zernike polynomials, Calibration, Interferometry, Monochromatic aberrations, Error analysis, Extreme ultraviolet, Geometrical optics, Shearing interferometers

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Proceedings Article | 24 March 2017 Paper

The thermal aberration analysis of a lithography projection lens

Yanjie Mao, Sikun Li, Gang Sun, Jian Wang, Lifeng Duan, Yang Bu, Xiangzhao Wang

Proceedings Volume 10147, 101471P (2017) https://doi.org/10.1117/12.2258037

KEYWORDS: Lens design, Thermal modeling, Lithography, Optical lithography, Refractive index, Optical design, Thermal analysis, Wavefront aberrations, Optical components, Silica, Photomasks

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SPIE Journal Paper | 22 February 2017

Method for improving measurement efficiency of lateral shearing interferometry

Jie Li, Feng Tang, Xiangzhao Wang, Fengzhao Dai, Lei Ding, Bo Chen, Xiaoyu Yang, Liqun Chai

OE, Vol. 56, Issue 02, 024107, (February 2017) https://doi.org/10.1117/12.10.1117/1.OE.56.2.024107

KEYWORDS: Wavefronts, Error analysis, Zernike polynomials, Interferometry, Wavefront reconstruction, Optical engineering, Computer simulations, Statistical analysis, Optical testing, Sensors

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Proceedings Article | 15 March 2016 Paper

Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography

Lei Wang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, Feng Tang

Proceedings Volume 9780, 97801V (2016) https://doi.org/10.1117/12.2230404

KEYWORDS: Source mask optimization, Particle swarm optimization, Lithography, Optical lithography, Resolution enhancement technologies, Photomasks, Particles, Molybdenum, Algorithm development, Manufacturing

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SPIE Journal Paper | 19 February 2016

Pixelated source optimization for optical lithography via particle swarm optimization

Lei Wang, Sikun Li, Xiangzhao Wang, Guanyong Yan, Chaoxing Yang

JM3, Vol. 15, Issue 01, 013506, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.1.013506

KEYWORDS: Particle swarm optimization, Particles, Photomasks, Optical lithography, Lithographic illumination, Lithography, Optimization (mathematics), Source mask optimization, Image quality, Resolution enhancement technologies

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SPIE Journal Paper | 20 October 2015

Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging

Lina Shen, Sikun Li, Xiangzhao Wang, Guanyong Yan

JM3, Vol. 14, Issue 04, 043504, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043504

KEYWORDS: Polarization, Lithography, Photomasks, Imaging systems, Diffraction, Lithographic illumination, Computer simulations, Image analysis, Zernike polynomials, Image processing

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SPIE Journal Paper | 20 March 2015 Open Access

Speckle reduction in optical coherence tomography by two-step image registration

Hang Zhang, Zhongliang Li, Xiangzhao Wang, Xiangyang Zhang

JBO, Vol. 20, Issue 03, 036013, (March 2015) https://doi.org/10.1117/12.10.1117/1.JBO.20.3.036013

KEYWORDS: Image registration, Optical coherence tomography, Speckle, Signal to noise ratio, Affine motion model, Motion models, Image segmentation, Image quality, Spatial resolution, Retina

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Proceedings Article | 18 March 2015 Paper

Source optimization using particle swarm optimization algorithm in photolithography

Lei Wang, Sikun Li, Xiangzhao Wang, Guanyong Yan, Chaoxing Yang

Proceedings Volume 9426, 94261L (2015) https://doi.org/10.1117/12.2181335

KEYWORDS: Particle swarm optimization, Particles, Optimization (mathematics), Optical lithography, Source mask optimization, Photomasks, Genetic algorithms, Resolution enhancement technologies, Lithography, Image quality

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Proceedings Article | 18 March 2015 Paper

Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality

Lina Shen, Sikun Li, Xiangzhao Wang, Guanyong Yan

Proceedings Volume 9426, 94261E (2015) https://doi.org/10.1117/12.2181336

KEYWORDS: Polarization, Lithography, Imaging systems, Diffraction, Photomasks, Received signal strength, Zernike polynomials, Image analysis, Matrices, Amplifiers

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Proceedings Article | 13 March 2015 Paper

Calibration of system errors in lateral shearing interferometer for EUV-wavefront metrology

Jie Li, Feng Tang, Xiangzhao Wang, Fengzhao Dai, Feibin Wu

Proceedings Volume 9422, 94222O (2015) https://doi.org/10.1117/12.2180265

KEYWORDS: Wavefronts, Sensors, Monochromatic aberrations, Calibration, Extreme ultraviolet lithography, Interferometry, Extreme ultraviolet, EUV optics, Zernike polynomials, Error analysis

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SPIE Journal Paper | 13 November 2014

In situ aberration measurement method using a phase-shift ring mask

Sikun Li, Xiangzhao Wang, Jishuo Yang, Lifeng Duan, Feng Tang, Guanyong Yan

JM3, Vol. 14, Issue 01, 011005, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.011005

KEYWORDS: Photomasks, In situ metrology, Process modeling, Image processing, Lithography, Principal component analysis, Error analysis, Image retrieval, Semiconducting wafers, Zernike polynomials

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Proceedings Article | 13 November 2014 Paper

A high-accuracy subaperture stitching system for nonflatness measurement of wafer stage mirror

Yunjun Lu, Feng Tang, Xiangzhao Wang, Yong Li, Xiulong Wan, Fudong Guo, Fengzhao Dai

Proceedings Volume 9276, 927617 (2014) https://doi.org/10.1117/12.2071824

KEYWORDS: Mirrors, Interferometers, Calibration, Surface finishing, Photovoltaics, Polishing, Semiconducting wafers, Spatial resolution, Optical testing, Lithography

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SPIE Journal Paper | 2 October 2014

Efficient source mask optimization using multipole source representation

Chaoxing Yang, Sikun Li, Xiangzhao Wang

JM3, Vol. 13, Issue 04, 043001, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043001

KEYWORDS: Source mask optimization, Computer simulations, Lithium, Lithography, Lithographic illumination, Genetic algorithms, Logic, Optimization (mathematics), Zernike polynomials, Airborne remote sensing

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Proceedings Article | 17 September 2014 Paper

A novel method for speckle reduction in optical coherence tomography by image registration

Hang Zhang, Zhongliang Li, Xiangzhao Wang, Nan Nan, Xuan Wang

Proceedings Volume 9230, 92301Y (2014) https://doi.org/10.1117/12.2068846

KEYWORDS: Image registration, Optical coherence tomography, Speckle, Signal to noise ratio, Affine motion model, Image quality, Eye, Detection and tracking algorithms, Image restoration, Motion models

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Proceedings Article | 17 September 2014 Paper

Full-range Fourier domain polarization-sensitive optical coherence tomography using sinusoidal phase modulation

Yan Chen, Xiangzhao Wang, Zhongliang Li, Nan Nan, Xin Guo

Proceedings Volume 9230, 92301S (2014) https://doi.org/10.1117/12.2068777

KEYWORDS: Phase modulation, Mirrors, Optical coherence tomography, Interfaces, Polarization, Beam splitters, Fourier transforms, Signal to noise ratio, Ferroelectric materials, Cameras

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SPIE Journal Paper | 8 August 2014

Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography

Xiaolei Liu, Xiangzhao Wang, Sikun Li, Guanyong Yan, Andreas Erdmann

JM3, Vol. 13, Issue 03, 033007, (August 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.033007

KEYWORDS: Photomasks, Diffraction, Critical dimension metrology, Extreme ultraviolet lithography, Waveguides, Extreme ultraviolet, Calibration, Mathematical modeling, Reflectivity, Wave propagation

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Proceedings Article | 17 April 2014 Paper

Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography

Xiaolei Liu, Xiangzhao Wang, Sikun Li, Guanyong Yan, Andreas Erdmann

Proceedings Volume 9048, 90483E (2014) https://doi.org/10.1117/12.2046333

KEYWORDS: Photomasks, Diffraction, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Silicon, Mathematical modeling, Lithographic illumination, Laser sintering, Reflectivity

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Proceedings Article | 31 March 2014 Paper

A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask

Sikun Li, Xiangzhao Wang, Jishuo Yang, Feng Tang, Guanyong Yan, Andreas Erdmann

Proceedings Volume 9052, 90521L (2014) https://doi.org/10.1117/12.2046649

KEYWORDS: Photomasks, Image processing, Process modeling, In situ metrology, Lithography, Principal component analysis, Image retrieval, Polarization, Error analysis, Databases

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Proceedings Article | 31 March 2014 Paper

In situ aberration measurement method using a phase-shift ring mask

Xiangzhao Wang, Sikun Li, Jishuo Yang, Feng Tang, Guanyong Yan, Andreas Erdmann

Proceedings Volume 9052, 90521J (2014) https://doi.org/10.1117/12.2046257

KEYWORDS: Photomasks, In situ metrology, Lithography, Principal component analysis, Process modeling, Image processing, Zernike polynomials, Lenses, Image retrieval, Monochromatic aberrations

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SPIE Journal Paper | 11 June 2013

In situ aberration measurement technique based on an aerial image with an optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 06, 063602, (June 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.6.063602

KEYWORDS: In situ metrology, Image processing, Principal component analysis, Process modeling, Lithography, Matrices, Optical engineering, Image retrieval, Lithographic illumination, Zernike polynomials

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Proceedings Article | 22 May 2013 Paper

Defect parameters retrieval based on optical projection images

Dongbo Xu, Sikun Li, Xiangzhao Wang, Tim Fühner, Andreas Erdmann

Proceedings Volume 8789, 87890J (2013) https://doi.org/10.1117/12.2018210

KEYWORDS: Photomasks, 3D modeling, Defect detection, Lithography, Monochromatic aberrations, Projection systems, Integrated optics, Nanostructures, Lithographic illumination, Optics manufacturing

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SPIE Journal Paper | 7 May 2013

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 05, 053603, (May 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.5.053603

KEYWORDS: Photomasks, Lithography, Artificial intelligence, Principal component analysis, Optical engineering, Process modeling, Wavefront aberrations, Monochromatic aberrations, Instrument modeling, Mechanics

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Proceedings Article | 12 April 2013 Paper

Source mask optimization using real-coded genetic algorithms

Chaoxing Yang, Xiangzhao Wang, Sikun Li, Andreas Erdmann

Proceedings Volume 8683, 86831T (2013) https://doi.org/10.1117/12.2010137

KEYWORDS: Source mask optimization, Photomasks, Genetic algorithms, Binary data, Logic, Lithographic illumination, Genetics, Optimization (mathematics), Computer programming, Inverse problems

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Proceedings Article | 18 December 2012 Paper

In situ aberration measurement technique based on aerial image with optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503N (2012) https://doi.org/10.1117/12.981334

KEYWORDS: Matrices, Lithographic illumination, Lithography, Image processing, Principal component analysis, Process modeling, Statistical analysis, Error analysis, Artificial intelligence, Imaging systems

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Proceedings Article | 18 December 2012 Paper

In situ aberration measurement technique based on quadratic Zernike model

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503O (2012) https://doi.org/10.1117/12.981328

KEYWORDS: Lithography, Principal component analysis, Wavefront aberrations, In situ metrology, Semiconducting wafers, Image processing, Photomasks, Computer simulations, Metrology, Artificial intelligence

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SPIE Journal Paper | 7 June 2012

Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens

Lifeng Duan, Xiangzhao Wang, Guanyong Yan, Anatoly Bourov

JM3, Vol. 11, Issue 02, 023009, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.023009

KEYWORDS: Lithography, Principal component analysis, Sensors, Monochromatic aberrations, Wavefront aberrations, Image sensors, Semiconducting wafers, Image processing, Photomasks, Process modeling

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Proceedings Article | 13 March 2012 Paper

Symmetric polarization aberration compensation method based on scalar aberration control for lithographic projection lens

Yuanying Tu, Xiangzhao Wang, Sikun Li, Lifeng Duan, Peng Bu

Proceedings Volume 8326, 83262T (2012) https://doi.org/10.1117/12.917909

KEYWORDS: Polarization, Lithography, Photomasks, Matrices, Resolution enhancement technologies, Birefringence, Critical dimension metrology, Wave plates, Polarizers, Received signal strength

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Proceedings Article | 5 October 2011 Paper

Analytical model for EUV mask diffraction field calculation

Yuting Cao, Xiangzhao Wang, Andreas Erdmann, Peng Bu, Yang Bu

Proceedings Volume 8171, 81710N (2011) https://doi.org/10.1117/12.896579

KEYWORDS: Photomasks, Diffraction, Mirrors, Extreme ultraviolet, Reflectivity, Systems modeling, Extreme ultraviolet lithography, Error analysis, Scattering, Calibration

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Proceedings Article | 30 September 2011 Paper

Experimental determination of aberration in lithographic lens by aerial image

Lifeng Duan, Xiangzhao Wang, Guanyong Yan, Anatoly Bourov

Proceedings Volume 8169, 816909 (2011) https://doi.org/10.1117/12.896319

KEYWORDS: Lithography, Monochromatic aberrations, Sensors, Image sensors, Semiconducting wafers, Wavefront aberrations, Photomasks, Process modeling, Statistical analysis, Error analysis

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Proceedings Article | 6 March 2009 Paper

Detailed operation procedure of three polarized Monte Carlo programs and compulsory optimizations

Xin Cheng, Xiangzhao Wang, Feng Tang, Peng Bu

Proceedings Volume 7280, 72800G (2009) https://doi.org/10.1117/12.820596

KEYWORDS: Monte Carlo methods, Tissue optics, Polarization, Scattering, Scattering media, Geometrical optics, Computer simulations, Backscatter, Image processing, Visualization

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Proceedings Article | 28 January 2009 Paper

Scattering performance analysis of reflectance photometer for quantifying gold labeled test strips

Lihua Huang, Youbao Zhang, Chengke Xie, Jianfeng Qu, Huijie Huang, Xiangzhao Wang

Proceedings Volume 7156, 71561O (2009) https://doi.org/10.1117/12.806529

KEYWORDS: Particles, Gold, Scattering, Photometry, Reflectivity, Light scattering, Absorption, Scanning electron microscopy, Mie scattering, Transmittance

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SPIE Journal Paper | 1 June 2008

Simultaneous phase-shifting ellipsometry based on grating beamsplitter

Kun Yang, Aijun Zeng, Xiangzhao Wang, Feng Tang, Hua Wang

OE, Vol. 47, Issue 06, 063602, (June 2008) https://doi.org/10.1117/12.10.1117/1.2948360

KEYWORDS: Ellipsometry, Phase shifts, Beam splitters, Polarizers, Refractive index, Sensors, Error analysis, Hybrid fiber optics, Calibration, Optical engineering

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SPIE Journal Paper | 1 May 2008 Open Access

One-shot parallel complex Fourier-domain optical coherence tomography using a spatial carrier frequency

Peng Bu, Xiangzhao Wang, Osami Sasaki

OE, Vol. 47, Issue 05, 050502, (May 2008) https://doi.org/10.1117/12.10.1117/1.2931575

KEYWORDS: CCD cameras, Mirrors, Optical coherence tomography, Wavefronts, Glasses, Fourier transforms, Spatial frequencies, Imaging systems, Image resolution, Range imaging

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Proceedings Article | 17 January 2008 Paper

Method for eliminating the influence of light intensity modulation in sinusoidal phase modulating laser diode interferometer

Zhongliang Li, Xiangzhao Wang, Bingjie Huang, Peng Bu, Defeng Zheng

Proceedings Volume 6723, 67230Y (2008) https://doi.org/10.1117/12.783072

KEYWORDS: Modulation, Interferometers, Semiconductor lasers, Phase shift keying, Phase modulation, Signal detection, Computer simulations, Signal processing, Ferroelectric materials, Light sources

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Proceedings Article | 8 January 2008 Paper

High-speed full range complex Fourier-domain optical coherence tomography using sinusoidal phase-modulating interferometry

Peng Bu, Xiangzhao Wang, Osami Sasaki, Xunbin Wei

Proceedings Volume 6826, 682605 (2008) https://doi.org/10.1117/12.756756

KEYWORDS: CCD cameras, Interferometry, Skin, Optical coherence tomography, Fourier transforms, Phase interferometry, Phase modulation, Interfaces, Mirrors, Biomedical optics

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Proceedings Article | 30 November 2007 Paper

Novel algorithm for modeling aberration-induced overlay in lithographic process

Fan Wang, Mingying Ma, Lifeng Duan, Xiangzhao Wang

Proceedings Volume 6724, 67240O (2007) https://doi.org/10.1117/12.782679

KEYWORDS: Lithography, Monochromatic aberrations, Wavefront aberrations, Zernike polynomials, Spherical lenses, Wavefronts, Computer simulations, Lithographic illumination, Overlay metrology, Reticles

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Proceedings Article | 28 November 2007 Paper

Parameter optimization of optically excited microresonator by a semiconductor laser subject to optical feedback

Shaoqing Wang, Xiangzhao Wang, Yingming Liu, Bingjie Huang, Hua Wang

Proceedings Volume 6724, 67240L (2007) https://doi.org/10.1117/12.782522

KEYWORDS: Semiconductor lasers, Microresonators, Silicon, Laser optics, Modulation, Chromium, Aluminum, Gold, Silver, Silicon films

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Proceedings Article | 27 November 2007 Paper

New parallel plate interferometer for measuring angular displacement

Defeng Zheng, Xiangzhao Wang, Osami Sasaki

Proceedings Volume 6723, 67230Z (2007) https://doi.org/10.1117/12.783074

KEYWORDS: Interferometers, Mirrors, Signal detection, Modulation, Phase measurement, Sensors, Ferroelectric materials, Semiconductor lasers, Reflectors, Stray light

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SPIE Journal Paper | 1 October 2007

Dynamic full-range Fourier-domain optical coherence tomography using sinusoidal phase-modulating interferometry

Peng Bu, Xiangzhao Wang, Osami Sasaki

OE, Vol. 46, Issue 10, 105603, (October 2007) https://doi.org/10.1117/12.10.1117/1.2798540

KEYWORDS: Optical coherence tomography, Interferometry, Interfaces, Phase interferometry, CCD cameras, Glasses, Imaging systems, Phase shifts, Mirrors, Phase shift keying

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SPIE Journal Paper | 1 September 2007

Small-dynamic-angle measurement using tangent relationship and phase-modulating technique

Defeng Zheng, Xiangzhao Wang, Osami Sasaki

OE, Vol. 46, Issue 09, 093602, (September 2007) https://doi.org/10.1117/12.10.1117/1.2784480

KEYWORDS: Prisms, Signal detection, Interferometers, Modulation, Phase interferometry, Sensors, Optical testing, Optical engineering, Phase modulation, Ferroelectric materials

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SPIE Journal Paper | 1 July 2007

Influence of birefringence dispersion on distributed measurement of polarization coupling in birefringent fibers

Feng Tang, Xiangzhao Wang, Yimo Zhang, Wencai Jing

OE, Vol. 46, Issue 07, 075006, (July 2007) https://doi.org/10.1117/12.10.1117/1.2756065

KEYWORDS: Birefringence, Optical fibers, Spatial resolution, Polarization, Dispersion, Light sources, Optical engineering, Sensing systems, Michelson interferometers, Signal to noise ratio

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Proceedings Article | 29 January 2007 Paper

A new real-time surface profile measurement using a sinusoidal phase modulating interferometry

Guotian He, Xiangzhao Wang, Dailin Li, Jianmin Hu

Proceedings Volume 6279, 62794J (2007) https://doi.org/10.1117/12.725393

KEYWORDS: Signal detection, Interferometers, Signal processing, Modulation, Phase interferometry, Interferometry, Glasses, CCD image sensors, Scanning probe microscopy, Helium neon lasers

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Proceedings Article | 29 January 2007 Paper

A new high-speed image sensing technique based on an ordinary CCD

Guotian He, Xiangzhao Wang, Dailin Li, Jianmin Hu

Proceedings Volume 6279, 62795I (2007) https://doi.org/10.1117/12.725432

KEYWORDS: Charge-coupled devices, Image sensors, CCD image sensors, Sensors, Signal processing, Interference (communication), Cadmium sulfide, Video, Optical testing, Clocks

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Proceedings Article | 19 May 2006 Paper

Coma aberration measurement by lateral image displacements at different defocus positions

Mingying Ma, Xiangzhao Wang, Fan Wang, Weijie Shi, Dongqing Zhang

Proceedings Volume 6150, 615003 (2006) https://doi.org/10.1117/12.676894

KEYWORDS: Monochromatic aberrations, Projection systems, Lithography, Optical lithography, Coherence (optics), Semiconducting wafers, Fluctuations and noise, Optical alignment, Ray tracing, Optical testing

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Proceedings Article | 19 May 2006 Paper

Method for measuring the granite surface topography of wafer stage with laser interferometer

Le He, Xiangzhao Wang, Weijie Shi, Jianming Hu

Proceedings Volume 6150, 615008 (2006) https://doi.org/10.1117/12.676906

KEYWORDS: Semiconducting wafers, Interferometers, Lithography, Time metrology, Wafer-level optics, Optical lithography, Optical testing, Tolerancing, Interferometry, Metrology

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SPIE Journal Paper | 1 May 2006

Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks

Weijie Shi, Xiangzhao Wang, Dongqing Zhang, Osami Sasaki

OE, Vol. 45, Issue 05, 053201, (May 2006) https://doi.org/10.1117/12.10.1117/1.2202917

KEYWORDS: Adaptive optics, Optical alignment, Projection systems, Lithography, Semiconducting wafers, Imaging systems, Image quality, Distortion, Monochromatic aberrations, Optical engineering

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SPIE Journal Paper | 1 September 2005

Optimization of the multiwavelength erbium-doped fiber laser in a unidirectional cavity without an isolator

Guo-Yong Sun, Ronghui Qu, Jingxin Yang, Xiangzhao Wang

OE, Vol. 44, Issue 09, 094204, (September 2005) https://doi.org/10.1117/12.10.1117/1.2047548

KEYWORDS: Modulation, Fiber lasers, Modulators, Optical isolators, Phase shift keying, Ferroelectric materials, Optical filters, Signal attenuation, Optical engineering

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SPIE Journal Paper | 1 May 2005

Phase unwrapping based on branch cut placing and reliability ordering

Yuangang Lu, Xiangzhao Wang, Guotian He

OE, Vol. 44, Issue 05, 055601, (May 2005) https://doi.org/10.1117/12.10.1117/1.1911683

KEYWORDS: Reliability, Algorithm development, Computer simulations, Optical engineering, Image quality, Connectors, 3D image processing, Fringe analysis, Magnetic resonance imaging, Interferometric synthetic aperture radar

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Proceedings Article | 14 February 2005 Paper

Displacement measurement based on moire technique and polarization modulation

Aijun Zeng, Xiangzhao Wang, Dailin Li, Zuoren Dong, Lihua Huang, Yongkai Zhao

Proceedings Volume 5634, (2005) https://doi.org/10.1117/12.572095

KEYWORDS: Moire patterns, Modulation, Polarization, Signal detection, Sensors, Diffraction gratings, Photoelastic modulators, Beam splitters, Polarizers, Diffraction

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Proceedings Article | 14 February 2005 Paper

Fiber Bragg grating sensor for the measurement of elevated temperature

Yage Zhan, Shiqing Xiang, Hong He, Rude Zhu, XiangZhao Wang

Proceedings Volume 5634, (2005) https://doi.org/10.1117/12.576576

KEYWORDS: Fiber Bragg gratings, Sensors, Metals, Temperature metrology, Head, Thermal sensing, Temperature sensors, Fiber optics sensors, Optical fibers, Silicon

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Proceedings Article | 10 February 2005 Paper

Performance test of focusing optics based on the Hartmann principle

Dan Liu, Yan Yan, Bingqiang Ren, Yongkai Zhao, Lihua Huang, Huijie Huang, Weixin Zhang, Deyan Xu, Xiangzhao Wang

Proceedings Volume 5638, (2005) https://doi.org/10.1117/12.574821

KEYWORDS: Chromatic aberrations, Aspheric lenses, CCD cameras, Optical testing, Inspection, Collimators, Optical components, Image processing, Optical inspection, Photography

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Proceedings Article | 27 January 2005 Paper

Exposure dose control for step-and-scan lithography

Liping Guo, Huijie Huang, Xiangzhao Wang, Dongqing Zhang

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.567919

KEYWORDS: Lithography, Control systems, Semiconducting wafers, Excimer lasers, Sensors, Pulsed laser operation, Time metrology, Calibration, Reticles, Critical dimension metrology

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Proceedings Article | 27 January 2005 Paper

Application of BP-neural networks in the FOCAL technique

Weijie Shi, Xiangzhao Wang, Dongqing Zhang, Fan Wang, Mingying Ma

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573822

KEYWORDS: Neural networks, Neurons, Monochromatic aberrations, Optical alignment, Semiconducting wafers, Lithography, Artificial neural networks, Evolutionary algorithms, Adaptive optics, Imaging systems

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Proceedings Article | 27 January 2005 Paper

A new method to determine the energy range for the FOCAL technique

Dongqing Zhang, Xiangzhao Wang, Weijie Shi, Fan Wang, Liping Guo, Jianming Hu, Mingying Ma, Le He

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573815

KEYWORDS: Adaptive optics, Image quality, Semiconducting wafers, Optical alignment, Lithography, Calibration, Monochromatic aberrations, Line width roughness, Photoresist processing, Optical lithography

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Proceedings Article | 27 January 2005 Paper

Coma measurement by transmission image sensor with a PSM

Fan Wang, Xiangzhao Wang, Mingying Ma, Dongqing Zhang, Weijie Shi, Jianming Hu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573642

KEYWORDS: Monochromatic aberrations, Binary data, Photomasks, Phase shifting, Image sensors, Diffraction, Coherence (optics), Wavefronts, Resolution enhancement technologies, Semiconducting wafers

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Proceedings Article | 18 January 2005 Paper

UPT-based biosensor and its application

Yongkai Zhao, Lei Zhou, Huijie Huang, Ruifu Yang, Lihua Huang, Bingqiang Ren, Jian Lu, Xiangzhao Wang

Proceedings Volume 5630, (2005) https://doi.org/10.1117/12.577006

KEYWORDS: Biosensors, Particles, Control systems, Phosphorescence, Statistical analysis, Biological research, Molecules, Molecular biology, Semiconductor lasers, Crystals

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Proceedings Article | 10 January 2005 Paper

A unidirectional multiwavelength erbium-doped fiber ring laser without isolator at room temperature

Guoyong Sun, Ronghui Qu, Jing Yang, Xiangzhao Wang, Zujie Fang

Proceedings Volume 5623, (2005) https://doi.org/10.1117/12.582107

KEYWORDS: Fiber lasers, Modulation, Optical isolators, Phase shift keying, Modulators, Ferroelectric materials, Linear filtering, Acousto-optics, Optical filters, Transducers

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SPIE Journal Paper | 1 December 2004

Sinusoidal phase-modulating laser diode interferometer for measuring angular displacement

Caini Zhang, Xiangzhao Wang

OE, Vol. 43, Issue 12, (December 2004) https://doi.org/10.1117/12.10.1117/1.1810141

KEYWORDS: Interferometers, Phase interferometry, Semiconductor lasers, CCD image sensors, Charge-coupled devices, Signal detection, Interferometry, Scanning probe microscopy, Light sources, Mirrors

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SPIE Journal Paper | 1 October 2004

Fiber Bragg grating temperature sensor for multiplexed measurement with high resolution

Yage Zhan, Haiwen Cai, Ronghui Qu, Shiqing Xiang, Zujie Fang, Xiangzhao Wang

OE, Vol. 43, Issue 10, (October 2004) https://doi.org/10.1117/12.10.1117/1.1786938

KEYWORDS: Fiber Bragg gratings, Sensors, Temperature sensors, Aluminum, Temperature metrology, Multiplexing, Linear filtering, Optical filters, Optical fibers, Optical resolution

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Proceedings Article | 20 September 2002 Paper

Simulated annealing algorithm for unwrapping noisy phase map

Zhenjun Peng, Xiangzhao Wang, Feng Qian, Xuefeng Wang, Xianghong Zhong

Proceedings Volume 4927, (2002) https://doi.org/10.1117/12.464028

KEYWORDS: Algorithms, Numerical simulations, Phase interferometry, Algorithm development, Mirrors, Annealing, Phase shifts, Mechanics, Interferometry, Optical interferometry

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Proceedings Article | 20 September 2002 Paper

Unwrapping phase map by estimating regions containing phase jumps

Feng Qian, Xiangzhao Wang, Zhenjun Peng, Xuefeng Wang

Proceedings Volume 4927, (2002) https://doi.org/10.1117/12.471440

KEYWORDS: Digital filtering, Image processing, Phase shift keying, Binary data, Computer simulations, Phase compensation, Nonlinear filtering, Modulation, Phase interferometry, Interferometry

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Proceedings Article | 16 October 2001 Paper

Intensity-modulating characteristics of a laser diode subject to optical injection

Xiangzhao Wang, Hongbin Lu, Xuefeng Wang, Feng Qian, Danyang Yu, Zujie Fang

Proceedings Volume 4602, (2001) https://doi.org/10.1117/12.445713

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Proceedings Article | 15 October 2001 Paper

Phase-shifting profilometer for measurement of the physical parameters of the fiber connector endface

Feng Qian, Xiangzhao Wang, Xuefeng Wang

Proceedings Volume 4601, (2001) https://doi.org/10.1117/12.444740

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Proceedings Article | 15 October 2001 Paper

All-fiber sinusoidal phase-modulating laser diode interferometer insensitive to the intensity change of the light source

Xuefeng Wang, Xiangzhao Wang, Caini Zhang, Danyang Yu, Gaoting Chen

Proceedings Volume 4601, (2001) https://doi.org/10.1117/12.444742

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Proceedings Article | 6 October 2000 Paper

Choice of modulation parameters in photothermal-modulation laser diode interferometer

Xianzhao Wang, Hongbin Lu, Xuefeng Wang, Danyang Yu, Feng Qian, Gaoting Chen, Zujie Fang

Proceedings Volume 4231, (2000) https://doi.org/10.1117/12.402835

KEYWORDS: Modulation, Interferometers, Semiconductor lasers, Light sources, Optical testing, Temperature metrology, Photothermal effect, Mirrors, Light, Beam splitters

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Proceedings Article | 9 May 2000 Paper

Measurements of refractive index and physical thickness using optical coherence tomography

Guiju Song, Xiangzhao Wang, Hongwu Ren, Weizai Zhang, Lianying Zhang, Zujie Fang

Proceedings Volume 4077, (2000) https://doi.org/10.1117/12.385563

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SPIE Journal Paper | 1 September 1999

Measurement of spatially nonuniform phase changes of a light beam utilizing the reflectivity characteristic of a self-pumped phase-conjugate mirror

Xiangzhao Wang, Osami Sasaki, Takamasa Suzuki, Takeo Maruyama

OE, Vol. 38, Issue 09, (September 1999) https://doi.org/10.1117/12.10.1117/1.602206

KEYWORDS: Reflectivity, Phase conjugation, Crystals, Tolerancing, Mirrors, Silicon, Computer simulations, Optical engineering, Phase measurement, Phase shift keying

SPIE Journal Paper | 1 October 1995

Exact measurement of flat surface profiles by object shifts in a phase-conjugate Fizeau interferometer

Osami Sasaki, Yuuichi Takebayashi, Xiangzhao Wang, Takamasa Suzuki

OE, Vol. 34, Issue 10, (October 1995) https://doi.org/10.1117/12.10.1117/12.210750

KEYWORDS: Phase conjugation, Fizeau interferometers, Glasses, Lenses, Mirrors, Interferometers, Phase measurement, Wave plates, Computer simulations, CCD image sensors

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SPIE Journal Paper | 1 April 1995

Response characteristics of a self-pumped phase-conjugate mirror to spatially nonuniform phase changes of an incident wave and their applications

Xiangzhao Wang, Osami Sasaki, Takamasa Suzuki, Takeo Maruyama

OE, Vol. 34, Issue 04, (April 1995) https://doi.org/10.1117/12.10.1117/12.196557

KEYWORDS: Phase conjugation, Reflectivity, Signal detection, Phase measurement, Crystals, Fizeau interferometers, Mirrors, Glasses, Electrical engineering, Interferometers

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SPIE Journal Paper | 1 August 1994

Sinusoidal phase-modulating Fizeau interferometer using a self-pumped phase conjugator for surface profile measurements

Xiangzhao Wang, Osami Sasaki, Yuuichi Takebayashi, Takamasa Suzuki, Takeo Maruyama

OE, Vol. 33, Issue 08, (August 1994) https://doi.org/10.1117/12.10.1117/12.173590

KEYWORDS: Glasses, Wave plates, Interferometers, CCD image sensors, Fizeau interferometers, Phase conjugation, Aluminum, Lenses, Ferroelectric materials, Phase interferometry

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Proceedings Article | 10 December 1993 Paper

Sinusoidal phase-modulating Fizeau interferometer using phase-conjugate wave

Osami Sasaki, Xiangzhao Wang, Yuuichi Takebayashi, Takamasa Suzuki

Proceedings Volume 2003, (1993) https://doi.org/10.1117/12.165461

KEYWORDS: Interferometers, Glasses, Phase conjugation, Fizeau interferometers, Lenses, Phase interferometry, CCD image sensors, Phase measurement, Wave plates, Interferometry

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