Dr. Klaus Edinger Profile

Dr. Klaus Edinger

Head Field of Business Repair at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 23 November 2024 Presentation + Paper

Presentation + Paper

Advanced absorber and compensation repair for EUV reticles utilizing a novel e-beam-based repair technique

Joseph Rodriguez, Scott Chegwidden, Andrew Elliott, Lingxuan Peng, Dinumol Devasia, Nathan Wilcox, Safak Sayan, Andrew Ridley, Franz-Josef Eberle, Michael Budach, Chanya Nguyen, Felix Hermanns, Horst Schneider, Klaus Edinger

Proceedings Volume 13216, 132160R (2024) https://doi.org/10.1117/12.3038766

KEYWORDS: Extreme ultraviolet, Reticles, Semiconducting wafers, Photomasks, Wafer level optics, Printing, Optics manufacturing, High volume manufacturing, Scanners, Reflection

Read Abstract +

Proceedings Article | 12 November 2024 Presentation + Paper

Presentation + Paper

Repair processes on next generation EUV materials

C. Chen, P. Weng, C. Chiang, P. Chen, Vincent C. Wen, Gerson Mette, Christian Felix Hermanns, Thorsten Hofmann, Klaus Edinger, Y. Li

Proceedings Volume 13216, 132160Q (2024) https://doi.org/10.1117/12.3034694

KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Electron beams, Mask cleaning

Read Abstract +

Proceedings Article | 15 September 2022 Presentation

Presentation

SEM-based photo mask repair

Klaus Edinger

Proceedings Volume PC12325, PC123250E (2022) https://doi.org/10.1117/12.2656143

Read Abstract +

Proceedings Article | 23 October 2015 Paper

Paper

Photomask repair using low-energetic electrons

K. Edinger, K. Wolff, P. Spies, T. Luchs, H. Schneider, N. Auth, Ch. Hermanns, M. Waiblinger

Proceedings Volume 9635, 96351P (2015) https://doi.org/10.1117/12.2207755

KEYWORDS: Photomasks, Electrons, Etching, Quartz, Ions, Chemistry, Electron beams, Molecules, Extreme ultraviolet, Particles

Read Abstract +

Proceedings Article | 17 October 2014 Paper

Paper

Bringing mask repair to the next level

K. Edinger, K. Wolff, H. Steigerwald, N. Auth, P. Spies, J. Oster, H. Schneider, M. Budach, T. Hofmann, M. Waiblinger

Proceedings Volume 9235, 92350R (2014) https://doi.org/10.1117/12.2072474

KEYWORDS: Photomasks, Ion beams, Ions, Chemistry, Electron beams, Quartz, Etching, Molecules, Image resolution, Extreme ultraviolet

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Paper

Challenging defect repair techniques for maximizing mask repair yield

Anthony Garetto, Jens Oster, Markus Waiblinger, Klaus Edinger

Proceedings Volume 7488, 74880H (2009) https://doi.org/10.1117/12.833404

KEYWORDS: Etching, Magnesium, Opacity, Optical properties, Bridges, Yield improvement, Cadmium, Scanning electron microscopy, Electron beams, Climatology

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Paper

High-resolution e-beam repair for nanoimprint templates

Marcus Pritschow, Harald Dobberstein, Klaus Edinger, Mathias Irmscher, Douglas Resnick, Kosta Selinidis, Ecron Thompson, Markus Waiblinger

Proceedings Volume 7488, 74880V (2009) https://doi.org/10.1117/12.833030

KEYWORDS: Scanning electron microscopy, Etching, Electron beams, Semiconducting wafers, Metals, Manufacturing, Silicon, Nanoimprint lithography, Photomasks, Ultraviolet radiation

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Paper

Advanced process capabilities for electron beam based photomask repair in a production environment

Anthony Garetto, Christof Baur, Jens Oster, Markus Waiblinger, Klaus Edinger

Proceedings Volume 7122, 71221K (2008) https://doi.org/10.1117/12.801554

KEYWORDS: Photomasks, Electron beams, Opacity, Etching, Sensors, Quartz, Resolution enhancement technologies, Chemistry, Ion implantation

Read Abstract +

Proceedings Article | 2 May 2008 Paper

Paper

Phase-shifting photomask repair and repair validation procedure for transparent and opaque defects relevant for the 45nm node and beyond

Christian Ehrlich, Ute Buttgereit, Klaus Boehm, Thomas Scheruebl, Klaus Edinger, Tristan Bret

Proceedings Volume 6792, 67920H (2008) https://doi.org/10.1117/12.798599

KEYWORDS: Photomasks, Phase shifts, Imaging systems, Electron beams, Opacity, Sensors, Bridges, Inspection, Visualization, Quartz

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Paper

Integrated photomask defect printability check, mask repair, and repair validation procedure for phase-shifting masks for the 45-nm node and beyond

Christian Ehrlich, Ute Buttgereit, Klaus Boehm, Thomas Scheruebl, Klaus Edinger, Tristan Bret

Proceedings Volume 6730, 67301Z (2007) https://doi.org/10.1117/12.746666

KEYWORDS: Photomasks, Phase shifts, Electron beams, Imaging systems, Sensors, Phase measurement, Inspection, Opacity, Metrology

Read Abstract +

Proceedings Article | 3 May 2007 Paper

Paper

Electron beam directed repair of fused silica imprint templates

Gerard Schmid, Douglas Resnick, Rainer Fettig, Klaus Edinger, Steven Young, William Dauksher

Proceedings Volume 6533, 65330P (2007) https://doi.org/10.1117/12.736921

KEYWORDS: Silica, Photomasks, Lithography, Etching, Electron beams, Scanning electron microscopy, Chromium, Atomic force microscopy, Nanoimprint lithography, Liquids

Read Abstract +

Proceedings Article | 21 June 2006 Paper

Paper

Recent application results from the novel e-beam-based mask repair system MeRiT MG

Christian Ehrlich, Klaus Edinger, Thorsten Hofmann, Wolfgang Degel

Proceedings Volume 6281, 62810M (2006) https://doi.org/10.1117/12.692647

KEYWORDS: Photomasks, Electron beams, Phase shifts, Magnesium, Binary data, Quartz, Imaging systems, Etching, Gemini Observatory, Inspection

Read Abstract +

Proceedings Article | 28 June 2005 Paper

Paper

Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool

Klaus Edinger, Volker Boegli, Wolfgang Degel

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617495

KEYWORDS: Photomasks, Binary data, Electron beams, Opacity, Chromium, Scanning electron microscopy, Etching, Magnesium, Quartz, Phase shifts

Read Abstract +

Proceedings Article | 16 June 2005 Paper

Paper

Application data of the electron beam based photomask repair tool MeRiT MG

Christian Ehrlich, Klaus Edinger, Volker Boegli, Peter Kuschnerus

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637273

KEYWORDS: Photomasks, Binary data, Electron beams, Opacity, Chromium, Quartz, Etching, Signal processing, Image processing, Magnesium

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Paper

Demonstration of damage-free mask repair using electron beam-induced processes

Ted Liang, Alan Stivers, Michael Penn, Dan Bald, Chetan Sethi, Volker Boegli, Michael Budach, Klaus Edinger, Petra Spies

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557788

KEYWORDS: Photomasks, Etching, Electron beams, Extreme ultraviolet, Scanning electron microscopy, Ruthenium, Atomic force microscopy, Gases, Chromium, Spatial resolution

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Paper

A novel electron-beam-based photomask repair tool

Klaus Edinger, Hans Becht, Rainer Becker, Volker Bert, Volker Boegli, Michael Budach, Susanne Göhde, Jochen Guyot, Thorsten Hofmann, Ottmar Hoinkis, Alexander Kaya, Hans Koops, Petra Spies, Bernd Weyrauch, Johannes Bihr

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.532866

KEYWORDS: Photomasks, Etching, Electron beams, Quartz, Silicon carbide, Scanning electron microscopy, Image processing, Chromium, Ion beams, Molecules

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Paper

Application of electron-beam induced processes to mask repair

Klaus Edinger, Volker Boegli, Michael Budach, Ottmar Hoinkis, Bernd Weyrauch, Hans Koops, Johannes Bihr, Jens Greiser

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504061

KEYWORDS: Photomasks, Etching, Electron beams, Ion beams, Lithography, Silicon carbide, Gemini Observatory, Magnetism, Signal attenuation, Electron beam lithography

Read Abstract +

Proceedings Article | 28 May 2003 Paper

Paper

Electron-beam mask repair with induced reactions

Hans Koops, Klaus Edinger, Johannes Bihr, Volker Boegli, Jens Greiser

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.514972

KEYWORDS: Photomasks, Electron beams, Etching, Platinum, Interferometers, Charged-particle lithography, Quartz, Silicon carbide, Scanning electron microscopy, Control systems

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Paper

Electron-beam-induced processes and their applicability to mask repair

Volker Boegli, Hans Koops, Michael Budach, Klaus Edinger, Ottmar Hoinkis, Bernd Weyrauch, Rainer Becker, Rudolf Schmidt, Alexander Kaya, Andreas Reinhardt, Stephan Braeuer, Heinz Honold, Johannes Bihr, Jens Greiser, Michael Eisenmann

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468200

KEYWORDS: Photomasks, Electron beams, Etching, Platinum, Ultraviolet radiation, Extreme ultraviolet, Quartz, Scanning electron microscopy, Interferometers, Chemical reactions

Read Abstract +

Proceedings Article | 4 November 2002 Paper

Paper

Thermal imaging of microwave power GaAs-FET with scanning thermal nanoprobe

Mojtaba Joodaki, Pawel Janus, Teodor Gotszalk, Guenter Kompa, Klaus Edinger, Ivo Rangelow

Proceedings Volume 4809, (2002) https://doi.org/10.1117/12.450989

KEYWORDS: Thermography, Temperature metrology, Microwave radiation, Transistors, Infrared radiation, Diodes, Near field, Spatial resolution, Liquid crystals, Nanoprobes

Read Abstract +

Showing 5 of 20 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement